Abstract
Thin films of polycrystalline magnesium oxide have been grown on glass substrate at low temperature (400°C) using the aerosol assisted‐metallorganic chemical vapor deposition technique, starting from magnesium acetate as precursor. For the first time highly 〈111〉‐oriented films grown at 0.40 μm/h have been obtained by this deposition technique. By changing the nature of the liquid source, a lower deposition rate (0.12 μm/b) and a strong 〈200〉 preferred orientation occur. The mean crystallite size along the direction of preferred orientation is, respectively, 35 and 50 nm for the 〈111〉‐ and 〈200〉 oriented film and the disorientation is around 8°. The films are free of carbonates or any residual organic contaminants. The surface roughness rms of the 〈200〉 oriented films is in the range of 6-9 nm and decreases as film thickness increases. Possible mechanisms for the occurrence of both texturing effects are discussed in terms of nucleation and growth texture. © 1999 The Electrochemical Society. All rights reserved.