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Preparation of Giant Magnetoresistance Co/Cu Multilayers by Electrodeposition

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© 1997 ECS - The Electrochemical Society
, , Citation Yukimi Jyoko et al 1997 J. Electrochem. Soc. 144 L5 DOI 10.1149/1.1837354

1945-7111/144/1/L5

Abstract

Reflection electron microscopy of electrodeposited Co, Cu/(111) Pt ultrathin layers and bilayers has revealed a heteroepitaxial and simultaneous multinuclear multilayer growth. "Giant" magnetoresistance and oscillatory antiferromagnetic interlayer coupling have been observed in a (111) textured Co/Cu multilayered nanostructure, which is compositionally modulated over nanometer length scales with distinct ferromagnetic Co‐Cu alloy and nonmagnetic Cu layers, prepared by electrodeposition under potential control in the presence of a very slight amount of . Such a multilayered structure containing a nominal Cu spacer layer thickness of 3.2 nm exhibits a large saturation magnetoresistance of more than 18% at room temperature.

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10.1149/1.1837354