Homogeneous Gas Phase Nucleation of Silane in Low Pressure Chemical Vapor Deposition (LPCVD)

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© 1988 ECS - The Electrochemical Society
, , Citation Z. M. Qian et al 1988 J. Electrochem. Soc. 135 2378 DOI 10.1149/1.2096275

1945-7111/135/9/2378

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10.1149/1.2096275