Computer Simulation and Controlled Growth of Large Diameter Czochralski Silicon Crystals

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© 1983 ECS - The Electrochemical Society
, , Citation K. M. Kim et al 1983 J. Electrochem. Soc. 130 1156 DOI 10.1149/1.2119907

1945-7111/130/5/1156

Abstract

Computer simulation leading to controlled large diameter Czochralski crystal growth is discussed. A simple mathematical model, which describes the different crystal growth phases including neck‐in, fast flat top, roll‐over to constant diameter bulk growth, and tail‐off is presented. This model, in conjunction with a computer‐implemented simulator, is used to simulate silicon crystal growth. Good agreement between simulation results and experimental crystal growth is obtained.

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10.1149/1.2119907