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Electron Microscope Study of the Nucleation and Growth of Electroless Cobalt and Nickel

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© 1972 ECS - The Electrochemical Society
, , Citation S. L. Chow et al 1972 J. Electrochem. Soc. 119 1614 DOI 10.1149/1.2404059

1945-7111/119/12/1614

Abstract

High‐resolution electron micrographs and diffraction patterns of thin discontinuous cobalt and nickel films deposited electrolessly under various conditions are presented. It is concluded that nickel, when deposited from strongly alkaline solutions assumes a fcc structure. Evidence is presented that the structure of cobalt deposits can be either fcc or hcp depending on the chemistry of the metalizing solution. Mixed cobalt‐nickel films appear to form a fcc structure like nickel.

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10.1149/1.2404059