Influence of Silicon on the High‐Temperature Oxidation of Copper and Iron

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© 1959 ECS - The Electrochemical Society
, , Citation J. W. Evans and S. K. Chatterji 1959 J. Electrochem. Soc. 106 860 DOI 10.1149/1.2427163

1945-7111/106/10/860

Abstract

The effects of 1 at. % of silicon on the oxidation behavior of pure copper at 850°–1000°C and of pure iron at 950°–1200°C have been studied by means of a thermobalance. Silicon has a marked effect on the oxidation of iron but relatively little on that of copper. The distinctive behavior is attributed mainly to the different diffusivities of oxygen in the base metals. The depth of subscale formed in the iron alloy suggests that the diffusivity of oxygen in iron is much faster than is commonly supposed.

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10.1149/1.2427163