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Publicly Available Published by De Gruyter January 1, 2009

The inductively coupled R.F. (radio frequency) plasma

  • M. I. Boulos
From the journal Pure and Applied Chemistry
https://doi.org/10.1351/pac198557091321
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Abstract

Conference

International Symposium on Plasma Chemistry, International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, Seventh, Eindhoven, The Netherlands, 1985-07-01–1985-07-05

Published Online: 2009-01-01
Published in Print: 1985-01-01

© 2013 Walter de Gruyter GmbH, Berlin/Boston

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From the journal
Pure and Applied Chemistry
Pure and Applied Chemistry
Volume 57 Issue 9
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Journal and Issue

Articles in the same Issue

Plasma spraying and extractive metallurgy: comparisons between mathematical modelling and measurements and between application and development
Heat and momentum transfer to particles in thermal plasma flows
Progress in thermal plasma deposition of alloys and ceramic fine particles
Progress in the applications of plasma surface modifications and correlations with the chemical properties of the plasma phase
Basic ion reactions and kinetics in plasmas
Dissociation of molecules in plasma and gas: the energy
Basic mechanisms of energetic molecule ejection from surfaces
Elementary processes in plasma-surface interactions with emphasis on ions
Optical diagnostics of low pressure plasmas
Applications of plasma polymerization
Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
Review of plasma deposition applications: preparation of optical waveguides
On the plasmaphysics of plasma-etching
The inductively coupled R.F. (radio frequency) plasma
The corona discharge, its properties and specific uses
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