Abstract
The diffusion of water into silica glass is modeled to result from the diffusion of molecular water into the glass and its reaction with the silicon-oxygen network to form SiOH groups. Equations for this diffusion-reaction mechanism are presented and compared with experimental diffusion profiles. At temperatures above about 500 °C the reaction goes to equilibrium, but at lower temperatures it does not, leading to a time dependence of the concentration of surface-reacted OH groups and of their apparent diffusion coefficient. At higher temperatures, the OH groups are nearly immobile, but diffuse far enough to sample neighboring OH groups, leading to a bimolecular reverse reaction. At lower temperatures only OH pairs react, giving a first-order reaction. When water tagged with O18 diffuses into silica, the O18 exchanges with O16 in the silicon-oxygen network of the glass. This process is also controlled by the rate of diffusion of molecular water into the glass, and the rate of O18-O16 exchange. This diffusion-reaction mechanism gives a unified description of the diffusion of water in silica glass from 160 °C to 1200 °C at least.
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References
A. J. Moulson and J. P. Roberts, Trans Faraday Society 57, 1208 (1961).
I. Burn and J. P. Roberts, Phys. Chem. Glasses 11, 106 (1970), and references therein.
R. H. Doremus, in Reactivity of Solids, edited by J. N. Mitchell, R. C. Devris, R. W. Roberts, and P. Cannon (John Wiley, New York, 1969), p. 66.
R. Pfeffer and M. Ohring, J. Appl. Phys. 52, 777 (1981).
M. Tomozawa, J. Am. Ceram. Soc. 68, C-251 (1985).
M. Helmich and F. Rauch, Glastech. Ber. 66, 195 (1993).
Y. Zhang, E. M. Stolper, and G. J. Wasserburg, Geochim et Cosm. Acta. 55, 441 (1991).
H. Wakabayashi and M. Tomozawa, J. Am. Ceram. Soc. 12, 1850 (1989).
W. A. Lanford, C. Burman, and R. H. Doremus, in Materials Sci. Res., Vol. 19, edited by R. L. Snyder and R. W. Condrate (Plenum Press, London, 1985), p. 203.
K. M. Davis and M. Tomozawa, in Diffusion in Amorphous Materials, edited by H. Jain and D. Gupta (TMS, Warrendale, PA, 1994), p. 119.
S. Rigo, F. Rochet, B. Agius, and A. Straboni, J. Electrochem. Soc. 129, 867 (1982).
F. Rochet and S. Rigo, Philos. Mag. B 55, 155 (1987).
J. Crank, Mathematics of Diffusion, 2nd ed. (Oxford Press, London, 1975).
D.J. Breed and R.H. Doremus, J. Phys. Chem. 80, 2471 (1976).
G. J. Roberts and J.P. Roberts, Phys. Chem. Glasses 5, 26 (1964).
J. Drury, G.J. Roberts, and J. Roberts, in Advances in Glass Technology (Plenum Press, New York, 1965), p. 249.
R.H. Doremus, Glass Science, 2nd ed. (John Wiley, New York, 1994), p. 135.
G.J. Roberts and J.P. Roberts, Phys. Chem. SI. 7, 82 (1986).
H. S. Carslaw and J.C. Jaeger, Conduction of Heat in Solids, 2nd ed. (Oxford Press, London, 1959).
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Doremus, R.H. Diffusion of water in silica glass. Journal of Materials Research 10, 2379–2389 (1995). https://doi.org/10.1557/JMR.1995.2379
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DOI: https://doi.org/10.1557/JMR.1995.2379