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Thickness dependence of microstructural evolution of ZnO films deposited by rf magnetron sputtering

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Abstract

The microstructural evolution, including preferred orientation and surface morphology, of ZnO films deposited by rf magnetron sputtering was investigated with increasing film thickness. Preferred orientation of the ZnO films changed from (0002) → (1011) → (1120) and fine and dense columnar grains also changed to large elongated grains with increasing thickness. Such selective texture growth was explained with an effect of highly energetic species bombardment on the growing film surface. The relationship between preferred orientation change and microstructural evolution was also discussed.

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Author notes

  1. Yong Eui Lee

    Present address: Ceramic Division, National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA

Authors and Affiliations

  1. Inter-University Semiconductor Research Center (ISRC) and School of Material Science and Engineering, Seoul National University, Seoul, 151-742, Korea

    Yong Eui Lee & Hyeong Joon Kim

  2. Department of Elec. and Advanced Materials Engineering, Kyonggi University, Suwon, 440-760, Korea

    Young Jin Kim

Authors
  1. Yong Eui Lee
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  2. Young Jin Kim
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  3. Hyeong Joon Kim
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Lee, Y.E., Kim, Y.J. & Kim, H.J. Thickness dependence of microstructural evolution of ZnO films deposited by rf magnetron sputtering. Journal of Materials Research 13, 1260–1265 (1998). https://doi.org/10.1557/JMR.1998.0180

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  • DOI: https://doi.org/10.1557/JMR.1998.0180

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