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Chemical sensors based on dielectric response of functionalized mesoporous silica films

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Abstract

Dielectric response of mesoporous silica films was monitored as a function of several gas-phase chemical species. The effects of humidity, ammonia, and methane on dielectric constant and dissipation factor of films subjected to different chemical treatments are described. Dielectric constant and dissipation factor of partially dehydroxylated films were found to be highly sensitive to both water vapor and ammonia in air. The capacitive devices based on mesoporous silica films show potential for use in chemical sensors.

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Author notes

  1. Karel Domansky

    Present address: Currently with Massachusetts Institute of Technology, Cambridge, MA, USA

Authors and Affiliations

  1. Pacific Northwest National Laboratory, MS K2–44, P.O. Box 999, 99352, Richland, Washington, USA

    Karel Domansky, Jun Liu, Li-Qiong Wang, Mark H. Engelhard & Suresh Baskaran

Authors
  1. Karel Domansky
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  2. Jun Liu
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  3. Li-Qiong Wang
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  4. Mark H. Engelhard
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  5. Suresh Baskaran
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Corresponding author

Correspondence to Suresh Baskaran.

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Domansky, K., Liu, J., Wang, LQ. et al. Chemical sensors based on dielectric response of functionalized mesoporous silica films. Journal of Materials Research 16, 2810–2816 (2001). https://doi.org/10.1557/JMR.2001.0387

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  • DOI: https://doi.org/10.1557/JMR.2001.0387

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