Abstract
High-mobility molybdenum-doped In2O3 films (IMO) were prepared on the normal glass substrate by reactive direct current magnetron sputtering from the molybdenum-embedded indium metal target. The effects of oxygen partial pressure, substrate temperature, and sputtering current on the optoelectrical properties of IMO films were investigated. The films with the highest carrier mobility of 50 cm2 V−1 s−1, as well as the average visible transmission greater than 80% including the 1.2-mm-thick glass substrate, were obtained. The minimum resistivity of the films is 3.7 × 10−4 ohm cm. The properties of the IMO films are sensitive to the oxygen partial pressure in the sputtering environment. X-ray diffraction measurements indicate that the films show In2O3 crystal structure.
Similar content being viewed by others
References
R.G. Gordon: Criteria for choosing transparent conductors. MRS Bull. 25(8), 52 (2000).
D.S. Ginley and C. Bright: Transparent conducting oxides. MRS Bull. 25(8), 15 (2000).
J.R. Bellingham, W.A. Phillips, and C.J. Adkins: Intrinsic performance limits in transparent conducting oxides. J. Mater. Sci. Let. 11, 263 (1992).
I. Hamberg and C.G. Granqvist: Evaporated Sn-doped In2O3 films: Basic optical properties and applications to energy-efficient windows. J. Appl. Phys. 60, R123 (1986).
T.J. Coutts, D.L. Young, and X. Li: Characterization of transparent conducting oxides. MRS Bull. 25(8), 58 (2000).
Y. Meng, X.L. Yang, H.X. Chen, J. Shen, Y.M. Jiang, Z.J. Zhang, and Z.Y. Hua: New transparent conductive thin film In2O3:Mo. Thin Solid Films 394, 218 (2001).
Y. Meng, X.L. Yang, H.X. Chen, J. Shen, Y.M. Jiang, Z.J. Zhang, and Z.Y. Hua: Molybdenum-doped indium oxide transparent conductive thin films. J. Vac. Sci. Technol. A 20, 288 (2002).
Y. Meng, Z.J. Zhang, and Z.Y. Hua: Study on carrier mobility of transparent conductive IMO films. Vac. Sci. Technol. 22, 265 (2002), (in Chinese).
Y. Meng, X.L. Yang, H.X. Chen, J. Shen, Y.M. Jiang, and Z.J. Zhang: Transparent conductive oxide doped thin films with high valence difference between dopant and ion substituted. Optoelectron. Technol. 21, 17 (2001), (in Chinese).
C.G. Granqvist and A. Hultåke: Transparent and conducting ITO films: New developments and applications. Thin Solid Films 411, 1 (2002).
Y. Yoshidaa, T.A. Gessert, C.L. Perkins, and T.J. Coutts: Development of radio-frequency magnetron sputtered indium molybdenum oxide. J. Vac. Sci. Technol. A 21, 1092 (2003).
Y. Yoshida, D.M. Wood, T.A. Gessert, and T.J. Coutts: Highmobility, sputtered films of indium oxide doped with molybdenum. Appl. Phys. Lett. 84, 2097 (2004).
D. Ginley, B. Roy, A. Ode, C. Warmsingh, Y. Yoshida, P. Parilla, C. Teplin, T. Kaydanova, A. Miedaner, C. Curtis, A. Martinson, T. Coutts, D. Teadey, H. Hosono, and J. Perkins: Non-vacuum and PLD growth of next generation TCO materials. Thin Solid Films 445, 193 (2003).
C. Warmsingh, Y. Yoshida, D.W. Readey, C.W. Teplin, J.D. Perkins, P.A. Parilla, L.M. Gedvilas, B.M. Keyes, and D.S. Ginley: High-mobility transparent conducting Mo-doped In2O3 thin films by pulsed laser deposition. J. Appl. Phys. 95, 3831 (2004).
S-Y. Sun, J-L. Huang, and D-F. Lii: Effects of oxygen contents on the electrical and optical properties of indium molybdenum oxide films fabricated by high density plasma evaporation. J. Vac. Sci. Technol. A 22, 1235 (2004).
J.F. Wager: Transparent electronics. Science 300, 1245 (2003).
K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono: Thin-film transistor fabricated in single-crystalline transparent oxide semiconductor. Science 300, 1269 (2003).
R.B.H. Tahar, T. Ban, Y. Ohya, and A. Salehi: Annealing effects on opto-electronic properties of sputtered and thermally evaporated indium-tin-oxide films. Thin Solid Films 312, 268 (1998).
M. Chen, Z.L. Pei, X. Wang, Y.H. Yu, X.H. Liu, C. Sun, and L.S. Wen: Intrinsic limit of electrical properties of transparent conductive oxide films. J. Phys. D: Appl. Phys. 33, 2538 (2000).
T.J. Vink, W. Walravae, J.F.C. Daams, P.C. Baarslag, and J.E.A.M. Meerakker: On the homogeneity of sputter-deposited ITO films. Part I: Stress and microstructure. Thin Solid Films 266, 145 (1995).
A.K. Kulkarni, K.H. Schulz, T.S. Lim, and M. Khan: Dependence of the sheet resistance of indium-tin-oxide thin films on grain size and grain orientation determined from x-ray diffraction techniques. Thin Solid Films 345, 273 (1999).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Li, X., Miao, W., Zhang, Q. et al. Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering. Journal of Materials Research 20, 1404–1408 (2005). https://doi.org/10.1557/JMR.2005.0184
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1557/JMR.2005.0184