Abstract
Dry film resist has been used in the fabrication of Masters in microfluidic devices for droplet generation. The minimum feature size in the resist was controlled by the type of mask (transparency or electron beam Cr mask), the resolution of the pattern in transparency masks (2400 or 5080 dpi) and thickness of resist in the range from 35 to 140 μm. The Master patterns formed in dry resist were replicated as a Ni shim and then hot embossed into Plexiglas 99524. These devices were used to generate water-in-oil droplets with a well defined dependence of diameter and frequency on flow parameters. The application of dry laminar resist and transparency masks has allowed the rapid fabrication of prototype devices.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Huebner, S. Sharma, M. Srisa-Art, F. Hollfelder, J.B. Ebel, and A.J. deMello, Lab Chip 8, 1244 (2008).
M. Joanicot and A. Ajdari, Science 309, 887 (2005).
G.F. Christopher and S.L. Anna, J.Phys D:Appl.Phys. 40, R319 (2007).
J.R. Millman, K.H. Bhatt, B.G. Prevo and O.D. Velev, Nature Materials 4, 98 (2004).
O.J. Miller, K. Bernath, J.J. Agresti, G. Amitai, B.T. Kelly, E. Mastrobattista, V. Tally, S. Magdassi, D.S. Tawfik and A.D. Griffiths, Nature Methods 3(7), 561 (2006).
W-L. Ong, J. Hua, B. Zhang, T-Y. Teo, J. Zhuo, N-T. Nguyen, N. Ranganathan and L. Yobas, Sensors and Actuators A138 203 (2007).
F. Courtois, L.F. Olguin, G. Whyte, D. Bratton, W.T.S. Huck, C. Abell and F. Hollfelder, ChemBiochem 9, 439 (2008).
L.M. Fidalgo, G. Whyte, D. Bratton, C.F. Kaminski, C. Abell and W.T.S. Huck, Angew.Chem.Int.Ed. 47, 2042 (2008).
H. Lorenz, L. Paratte, R. Luthier, N.F. de Rooij and P. Renaud, Sensors and Actuators A53, 364 (1996).
K. Stephan, P. Pittet, L. Renaud, P. Kleimann, P. Morin, K. Ouaini and R. Ferrigno, J. Micromech. Microeng. 17 N69 (2007).
Y-C. Tsai, H-P. Jen, K-W. Lin and Y-Z. Hsieh, Journal of Chromatography A 1111, 267 (2006).
P. Vulto, N. Glade, L. Altomare, J. Bablet, L. Del Tin, G. Medoro, I. Chartier, N. Manaresi, M. Tartagni and R. Guerrieri, Lab Chip 5 158 (2005).
A. Piruska, I. Nikcevik, S.H. Lee, C. Ahn, W.R. Heinman, P.A. Limbach and C.J. Seliskar, Lab Chip. 5 1348 (2005).
S. Zhao, H. Cong and T. Pan Lab Chip. DOI: 10.1039/b817925e (2009).
Acknowledgments
Ni shims were produced by F. Glenn and B. Sexton.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Leech, P.W., Wu, N. & Zhu, Y. Microfluidic Channel Fabrication in Dry Film Resist for Droplet Generation. MRS Online Proceedings Library 1191, 0410 (2009). https://doi.org/10.1557/PROC-1191-OO04-10
Published:
DOI: https://doi.org/10.1557/PROC-1191-OO04-10