Changes in the Crystal Structure of RF-Magnetron Sputtered BaTiO3 Thin Films

Kenji UCHINO; Nam-Yang LEE; Tamaki TOBA; Narikazu USUKI; Hideaki ABURATANI; Yukio ITO

doi:10.2109/jcersj.100.1091

Changes in the Crystal Structure of RF-Magnetron Sputtered BaTiO₃ Thin Films

Kenji UCHINO, Nam-Yang LEE, Tamaki TOBA, Narikazu USUKI, Hideaki ABURATANI, Yukio ITO

Author information

Keywords: RF-magnetron sputtering, BaTiO₃ thin film, Annealing process, Critical grain size, Phase transition

JOURNAL FREE ACCESS

1992 Volume 100 Issue 1165 Pages 1091-1093

DOI https://doi.org/10.2109/jcersj.100.1091

Details

Abstract

The crystal structure of BaTiO₃ thin films fabricated by RF-magnetron sputtering has been investigated. As-sputtered films exhibited a cubic structure with a small grain size of about 6-8nm. After annealing at a temperature above 1100°C, the crystal structure changed from cubic to tetragonal, because the annealing process caused grain growth. The critical grain size of the thin films which provided the cubic structure existed in the range of 0.1-0.2μm. This value agreed well with the critical grain size of BaTiO₃ fine particles, 0.12μm.

Corresponding author

Register with J-STAGE for free!