Journal of the Ceramic Society of Japan
Online ISSN : 1882-1022
Print ISSN : 0914-5400
ISSN-L : 0914-5400
Fine Patterning of Al2O3 Thin Films by the Photolysis of Gel Films Chemically Modified with Benzoylacetone
Gaoyang ZHAONoboru TOHGE
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1995 Volume 103 Issue 1204 Pages 1293-1296

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Abstract

The effects of UV-irradiation on the properties of Al2O3 gel films obtained from Al(O-sec-Bu)3 chemically modified with benzoylacetone have been studied. These gel films showed an optical absorption band at around 325nm characteristic of the π-π* transition in the chelate ring. The irradiation of UV-light of 365nm on the gel films dissociated the chelate ring and simultaneously decreased the solubility of the gel films in acetone solutions containing HNO3. This finding was successfully applied to the fine patterning of Al2O3 films. The gel films were irradiated with UV-light and then leached in HNO3-acetone solutions, followed by the heat treatment at 400°C to form finely patterned Al2O3 films on a variety of substrates.

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