Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Formation of Semiconducting Polymer Film by Laser CVD
Akira WatanabeTakashi KawatoMinoru MatsudaOsamu Ito
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1997 Volume 10 Issue 2 Pages 197-204

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Abstract

The thin films of semiconducting polymers such as poly(N-vinylcarbazole), polythiophene, polypyrrole, and polyaniline were formed by the laser chemical vapor deposition (CVD). The 355-nm laser excitation of N-vinylcarbazole deposited on a quartz substrate gave the poly(N-vinylcarba-zole) film with the molecular weight Mw=11860 (Mw/Mn=7.18). The sandwich excimer/second excimer emission ratio of the time-resolved emission spectra suggested the isotactic structure of the poly(N-vinylcarbazole) film prepared by the laser CVD. The micropatterns of the poly(N-vinylcarbazole) with the resolution of about 20μm were formed by the laser irradiation through a photomask. The laser flash photolysis of the N-vinylcarbazole showed the generation of the radical cation, which suggests the cationic polymerization mechanism. The optical band gap of polythiophene film was decreased with increasing laser excitation power.

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© The Technical Association of Photopolymers, Japan
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