2012 Volume 25 Issue 2 Pages 235-238
Continuous nano structures whose sizes 100 nm line and space were successfully fabricated using two step nanoimprint including oxygen (O2) plasma irradiation on a silicon substrate in 8 × 56 mm2 area. Silicon substrate surface condition is important property because fine and continuous pattern forming depend on photo curable resin uniform coating. O2 plasma irradiation is realized to change into hydrophilic without damage for silicon substrate. The water contact angle was decreased to smaller than 40° after O2 plasma irradiation. Therefore O2 plasma irradiation has an advantage of treatment process for continuous nanostructure forming. Our activities on UV nanoimprint lithography are expected to be progress for large area continuous nano structures fabrication.
