The Effect of Citric Ion on the Spin-Sprayed ZnO Films: IR and XPS Study for the Organic Impurities

Hajime Wagata; Naoki Ohashi; Ken Ichi Katsumata; Kiyoshi Okada; Nobuhiro Matsushita

doi:10.4028/www.scientific.net/KEM.485.291

Paper Titles

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Solvothermal Synthesis of WO₃ Photocatalysts and their Enhanced Activity
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Molecular Dynamics Study on Dielectric Properties of Silicon Oxynitride: Composition and Microstructure Dependence
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The Effect of Citric Ion on the Spin-Sprayed ZnO Films: IR and XPS Study for the Organic Impurities
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Evaluation of Compact X-Ray Source Using Multiple LiTaO₃ Single Crystals
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 485The Effect of Citric Ion on the Spin-Sprayed ZnO...

The Effect of Citric Ion on the Spin-Sprayed ZnO Films: IR and XPS Study for the Organic Impurities

Abstract:

ZnO films with controlled microstructures and crystal orientations were fabricated on nonseeded substrates by a spin-spray method employing tri-sodium citrate as a structure-directing agent at 90°C. The microstructure of the films changed from a rod array to a dense film by addition of the tri-sodium citrate in the solution. The FT-IR spectra of the films prepared with citrate contained organic molecules including carboxyl groups, being attributed to citric ion. Surface analysis by XPS indicated that the adsorbed citric ions were estimated to form zinc-citrate complex including ammonium ion or ammonium citrate.

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Periodical:

Key Engineering Materials (Volume 485)

Pages:

291-294

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.485.291

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Online since:

July 2011

Authors:

Hajime Wagata, Naoki Ohashi, Ken Ichi Katsumata, Kiyoshi Okada, Nobuhiro Matsushita

Keywords:

FT-IR, Solution Process, Spin-Spray Method, XPS, ZnO Film

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