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Synthesis and Characterization of Al4SiC4: A “New” Wide Band Gap Semiconductor Material
Abstract:
High temperature solution growth of Al4SiC4 single crystals was carried out from the melt of silicon and aluminium pieces in a graphite crucible used as carbon source (typically 1800°C under 1 bar of argon). The obtained crystals, in the mm scale, were then characterized by a variety of techniques including: Raman spectroscopy, transmission electron microscopy techniques, X-ray diffraction and UV-Vis-NIR spectroscopy. A good structural quality was revealed by TEM, ensuring a well resolved Raman spectrum. The UV-Vis transmission spectrum shows an optical gap located around 2-2.5 eV.
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Pages:
974-977
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Online since:
June 2015
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