Preparation and Photoelectric Performance of Eu3+-Doped Porous TiO2 Thin Film Electrode

Yi Zhou; Ke Long Huang; Mingming Dang; Hong Li; Cai Xia Lv; De Hui Shi

doi:10.4028/www.scientific.net/AMR.97-101.2209

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 97-101Preparation and Photoelectric Performance of...

Preparation and Photoelectric Performance of Eu³⁺-Doped Porous TiO₂ Thin Film Electrode

Abstract:

The nanoporous TiO2 film doped Eu3+ were prepared by combining the sol-gel and hydrothermal method, which could be applied to dye-sensitized solar cells(DSSC). The films were characterized by XRD, SEM and UV-vis DRS. DSSC photoelectric properties were evaluated by recording current-voltage characteristics under simulated sunlight illumination. The results indicated that Eu3+-doped TiO2 film electrodes increased short-circuit current and the fill facter availably; when TiO2 doping concentration for Eu3+ was 2.0mol%, a short circuit current of 0.389mA, an open circuit voltage of 0.6006V and a fill factor of 0.60 were obtained, which was remarkably better than of undoped TiO2 film electrode; and the optimal thickness attained in this work was 17.2um.

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Periodical:

Advanced Materials Research (Volumes 97-101)

Pages:

2209-2212

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.97-101.2209

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Online since:

March 2010

Authors:

Yi Zhou, Ke Long Huang, Mingming Dang, Hong Li, Cai Xia Lv, De Hui Shi

Keywords:

Coating Method, Eu³⁺-Doped, Photoelectric Performance, Porous TiO₂ Thin Film

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