Sintering of Dense Silicon Nitride Ceramics at Low Temperature

José Carlos Bressiani; Luis Antonio Genova

doi:10.4028/www.scientific.net/AST.45.1717

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HomeAdvances in Science and TechnologyAdvances in Science and Technology Vol. 45Sintering of Dense Silicon Nitride Ceramics at Low...

Sintering of Dense Silicon Nitride Ceramics at Low Temperature

Abstract:

Densification curves of silicon nitride specimens with varying composition were determined with the aid of a dilatometer and these curves are presented in this paper. A novel procedure has been used to determine the densification curves as well as the temperature at which the rate of densification was highest. From these data, sintering profiles have been proposed to produce silicon nitride based ceramics with high apparent density (above 96% of theoretical density) at temperatures as low as 1520º C, with incipient grain growth. This procedure also enabled efficient separation of the densification and grain growth phenomena and it can be used in other two-step sintering studies.

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Periodical:

Advances in Science and Technology (Volume 45)

Pages:

1717-1722

DOI:

https://doi.org/10.4028/www.scientific.net/AST.45.1717

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Online since:

October 2006

Authors:

José Carlos Bressiani, Luis Antonio Genova

Keywords:

Densification, Dilatometer, Sintering

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