Magnetron Sputtering of NiCr/NiSi Thin-Film Thermocouple Sensor for Temperature Measurement when Machining Chemical Explosive Material

Qi Yong Zeng; Tao Hong; Le Chen; Yun Xian Cui

doi:10.4028/www.scientific.net/KEM.467-469.134

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 467-469Magnetron Sputtering of NiCr/NiSi Thin-Film...

Magnetron Sputtering of NiCr/NiSi Thin-Film Thermocouple Sensor for Temperature Measurement when Machining Chemical Explosive Material

Abstract:

Temperature plays a vital role in the machining industry today. A Nickel-Chrome versus Nickel-Silicon thin-film thermocouple system has been established for measuring instantaneous workpiece temperature in chemical explosive material machining. The NiCr/NiSi thin-film thermocouples have been deposited inside high speed steel cutters by magnetron sputtering. The typical deposition conditions are summarized. Static and dynamic calibrations of the NiCr/NiSi thin-film thermocouples are presented. The Seebeck coefficient of the TFTC is 40.4 μV/°C which is almost the same as that of NiCr/NiSi wire thermocouple. The response time is about 0.42ms. The testing results indicate that the developed NiCr/NiSi thin-film thermocouple sensors can respond fast enough to catch the very short temperature pulse and perform excellently when machining chemical explosive material in situ.

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Periodical:

Key Engineering Materials (Volumes 467-469)

Pages:

134-139

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.467-469.134

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Online since:

February 2011

Authors:

Qi Yong Zeng, Tao Hong, Le Chen, Yun Xian Cui

Keywords:

Chemical Explosive Material, Machining, Magnetron Sputtering, Thin Film Thermocouple

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