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HomeKey Engineering MaterialsKey Engineering Materials Vols. 510-511Effect of Post-Deposition Annealing Treatment on...

Effect of Post-Deposition Annealing Treatment on the Structural, Optical and Gas Sensing Properties of TiO₂ Thin Films

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Abstract:

One of the potential applications of TiO₂ is its use in gas sensor technology. The aim of this work was to study the gas sensing properties of TiO₂ thin films in combination with the effect of post-deposition annealing treatment. Titanium dioxide thin films with thickness 100 nm were prepared by the reactive dc magnetron sputtering. The thin films were deposited on sapphire substrate from a titanium target in an oxygen atmosphere. The samples were then post-annealed in air in the temperature range 600 °C 1000 °C. Crystal structure, surface topography and absorption edge of the thin films have been studied by X-ray Diffraction technique, Atomic Force Microscopy and UV-VIS Spectroscopy. It was found that the phase gradually changed from anatase to rutile, the grain size and roughness tended to increase with increasing post-annealing temperature. The effect of these factors on gas sensing properties was discussed. For electrical measurements comb-like Pt electrodes were prepared by standard photolithography and the films were exposed to different concentrations of H₂ gas up to 10000 ppm in synthetic air at various operating temperatures from 200 °C to 350 °C.

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Advanced Materials XII

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Periodical:

Key Engineering Materials (Volumes 510-511)

Pages:

467-474

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.510-511.467

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Online since:

May 2012

Authors:

A.A. Haidry, P. Durina, M. Tomasek, J. Gregus, P. Schlosser, M. Mikula, M. Truhly, T. Roch, T. Plecenik, A. Pidik, M. Zahoran, P. Kus, A. Plecenik

Keywords:

Activation Energy, Annealing Effect, Bandgap, Grain Size, Hydrogen Gas Sensors, TiO₂ Rutile/Anatase

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