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HomeMaterials Science ForumMaterials Science Forum Vols. 480-481Structural Modifications in Thin Films Caused by...

Structural Modifications in Thin Films Caused by Gamma Radiation

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Abstract:

This paper reports on the gamma radiation-induced changes in thin oxide films deposited by thermal vacuum technique. Structures of various oxides thin films, such as In2O3, SiO and TeO2 and their mixtures in different proportions were studied. The influence of gamma radiation on In2O3/SiO films has resulted in significant changes in the microstructure of this film. Some kind of agglomerations with variable sizes in the range 0.5-3 µm has occurred. After a dose of 8160 µSv an evidence of partial crystallisation was observed with X-ray diffraction. Structural changes in TeO2 thin film were explored by means of Raman spectroscopy. After they have been exposed to g- radiation, a strong peak appeared at 448.83 cm-1, indicating further transformation to g-TeO2 modification.

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Cross-Disciplinary Applied Research in Materials Science and Technology

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Periodical:

Materials Science Forum (Volumes 480-481)

Pages:

13-20

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.480-481.13

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Online since:

March 2005

Authors:

Khalil Arshak, Olga Korostynska, John Henry

Keywords:

Gamma Radiation, Metal Oxide, Raman Spectra, Thin Film, X-Ray Diffraction (XRD)

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[1] V.E. Heinrich and P.A. Cox: The surface science of metal oxides (Cambridge University Press, Cambridge 1994).

[2] G. Pacchioni: Solid State Sciences Vol. 2 (2000), p.161.

[3] K. Arshak, O. Korostynska and F. Fahim: Sensors Vol. 3 (2003), p.176.

[4] E. Atanassova et al: Microelectronics Journal Vol 32 (2001), p.553.

[5] J.D. Zhang, S. Fung, L. Li-Bin and L. Zhi-Jun: Surf. Coat. Tech. Vol. 158-159 (2002), p.238.

[6] K. Arshak and O. Korostynska: Proc. IEEE Sensors Vol 1 (2002), p.547.

[7] L.N. Trefilova et al: Radiat. Meas. Vol 33 (2001), p.687.

[8] R.Y. Zhu: Nucl. Instrum. Meth. A Vol. 413 (1998), p.297.

[9] S.M. Kaczmarek et al: Cryst. Res. Technol. Vol. 34 (1999), p.719.

[10] K.L. Chopra: Thin film phenomena (Robert E. Krieger Publishing Company, Florida 1979).

[11] K. I. Arshak and C.A. Hogarth: Thin Solid Films Vol. 137 (1986), 281.

[12] C.H. Lee, C.V. Kuo and C.L. Lee: Thin Solid Films Vol. 173 (1989), p.59.

[13] P. Bogdanov et al: Sensor Actuat B-Chem. Vol. 57 (1999), p.153.

[14] K. Arshak, C.A. Hogarth and M.J. Ilyas: Mater. Sci. Lett. Vol. 3 (1984), 1035.

[15] K. Tominaga et al: Vacuum Vol. 59 (2000), p.546.

[16] K. Arshak and K. Twomey: Sensors Vol. 2 (2002), p.205.

[17] J.C. Champarnaud-Mesjard et al: J. Phys. Chem. Solids Vol. 61 (2000), p.1499.

[18] A.P. Mirgorodsky et al: J. Phys. Chem. Solids Vol. 61 (2000), p.501.

[19] C. Duverger et al: J. Mol. Struct. Vol. 410-411 (1997), p.285.

[20] T. Uchino and T. Yoko: J. Non-Cryst. Solids Vol. 204 (1996), p.243.