Analysis of SiC Islands Formation during First Steps of Si Carbonization Process

Article Preview

Abstract:

The effect of the temperature at which the carbon source is introduced in the reactor on the early stages of the carbonization process is analyzed here. Three samples heated up to 1150°C with propane introduction temperatures (Tintro) of 725, 1030 and 1100°C are analyzed by transmission electron microscopy and attenuated total reflectance. The size of the SiC nuclei increases with Tintro. There is also an effect on the strain of the resulting carbonization layer. The electron diffraction pattern of the sample with the highest Tintro shows a fully relaxed 3C-SiC layer, while no evidence of SiC relaxation is present in low Tintro samples where the SiC islands seems to be pseudomorphic.

You might also be interested in these eBooks

Info:

Periodical:

Materials Science Forum (Volumes 483-485)

Pages:

555-558

Citation:

Online since:

May 2005

Export:

Price:

[1] P.A. Ivanov and V.E. Chelnokov, Semicond. Sci. Technol. Vol. 7 (1992), p.863.

Google Scholar

[2] P.G. Neudeck, SiC technology, in : W. -K. Chen (Ed. ), The VLSI Handbook, the Electrical Engineering Handbook Series, CRC Press and IEEE Press, Boca Raton, Florida, 2000, p.6. 1-6. 24.

Google Scholar

[3] http: /mems. cwru. edu/SiC.

Google Scholar

[4] M. Mehregany, C.A. Zorman, J. Cryst. Growth Vol. 355 (1999), p.518.

Google Scholar

[5] T. Chassagne, G. Ferro, D. Chaussende, F. Cauwet,Y. Monteil, J. Bouix, Thin Solid Films Vol. 402 (2002), p.83.

DOI: 10.1016/s0040-6090(01)01597-8

Google Scholar

[6] E. Bustarret, D. Araujo, D. Mendez, F.M. Morales, F.J. Pacheco, S.I. Molina, N. Rochat, G. Ferro, Y. Monteil, Proc. Int. Conf. on Silicon Carbide and Related Materials, Mater. Sci. Forum, Vol. 457-460 (2004), p.277.

DOI: 10.4028/www.scientific.net/msf.457-460.277

Google Scholar

[7] N. Rochat, A. Chabli, F. Bertin, M. Olivier, C. Vergnaud, P. Mur, J. Appl. Phys. Vol. 91 (2002), p.5029.

Google Scholar

[8] C. Long, S.A. Ustin and W. Ho, J. Appl. Phys. Vol. 86 (1999), p.2509.

Google Scholar

[9] Jae Hwack Pyo and Ki. Woong Whang, Thin Solid Films, Vol. 435 (2003), p.340.

Google Scholar