[1]
G. Lütjering, J.C. Williams, Titanium, Springer-Verlag, Berlin, Heidelberg, (2007).
Google Scholar
[2]
C. Leyens, M. Peters, Titanium and Titanium Alloys: Fundamentals and Applications, Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, (2003).
Google Scholar
[3]
A.L. Pilchak, W.J. Porter, R. John, Room temperature fracture processes of a near-alpha titanium alloy following elevated temperature exposure, Journal of Materials Science, 47 (2012) 7235-7253.
DOI: 10.1007/s10853-012-6673-y
Google Scholar
[4]
K.S. McReynolds, S. Tamirisakandala, A Study on Alpha-Case Depth in Ti-6Al-2Sn-4Zr-2Mo, Metallurgical and Materials Transactions a-Physical Metallurgy and Materials Science, 42A (2011) 1732-1736.
DOI: 10.1007/s11661-011-0710-3
Google Scholar
[5]
Q. Ru, S.J. Hu, Effects of Ti0.5Al0.5N coatings on the protecting against oxidation for titanium alloys, Rare Metals, 29 (2010) 154-161.
DOI: 10.1007/s12598-010-0027-1
Google Scholar
[6]
M. Delmas, D. Poquillon, Y. Kihn, C. Vahlas, Al-Pt MOCVD coatings for the protection of Ti6242 alloy against oxidation at elevated temperature., Surf. Coat. Techn., 200 (2005) 1413-1417.
DOI: 10.1016/j.surfcoat.2005.08.028
Google Scholar
[7]
M. Delmas, C. Vahlas, Microstructure of Metalorganic Chemical Vapor Deposited Aluminium Coatings on Ti6242 Alloy, J. Electrochem. Soc., 154 (2007) D538-D542.
DOI: 10.1149/1.2769265
Google Scholar
[8]
A.-L. Thomann, C. Vahlas, L. Aloui, D. Samélor, A. Caillard, N. Shaharil, R. Blanc, E. Millon, Conformity of Aluminum Thin Films Deposited onto Micro-Patterned Silicon Wafers by Pulsed Laser Deposition, Magnetron Sputtering, and CVD, Chem. Vap. Dep., 17 (2011) 366–374.
DOI: 10.1002/cvde.201106936
Google Scholar
[9]
Z.P. Jiang, X. Yang, Y.F. Liang, G.J. Hao, H. Zhang, J.P. Lin, Favorable deposition of gamma-Al2O3 coatings by cathode plasma electrolysis for high-temperature application of Ti-45Al-8.5Nb alloys, Surface & Coatings Technology, 333 (2018) 187-194.
DOI: 10.1016/j.surfcoat.2017.11.005
Google Scholar
[10]
Y. Balcaen, N. Radutoiu, J. Alexis, J.D. Béguin, L. Lacroix, D. Samelor, C. Vahlas, Mechanical and barrier properties of MOCVD processed alumina coatings on TA6V titanium alloy, Surf. Coat. Techn., 206 (2011) 1684-1690.
DOI: 10.1016/j.surfcoat.2011.09.056
Google Scholar
[11]
G. Boisier, M. Raciulete, D. Samélor, N. Pébère, A.N. Gleizes, C. Vahlas, Electrochemical behavior of chemical vapor deposited protective aluminium oxide coatings on Ti6242 titanium alloy, Electrochem. Sol. State Lett., 11 (2008) C55-C57.
DOI: 10.1149/1.2968109
Google Scholar
[12]
L. Baggetto, C. Charvillat, J. Esvan, Y. Thébault, D. Samélor, H. Vergnes, B. Caussat, A. Gleizes, C. Vahlas, A process-structure investigation of aluminum oxide and oxycarbide thin films prepared by direct liquid injection chemical vapor deposition of dimethylaluminum isopropoxide (DMAI), Chem. Vap. Dep., 21 (2015) 343-351.
DOI: 10.1002/cvde.201507190
Google Scholar
[13]
C. Dupressoire, A. Rouaix-Vande Put, P. Emile, C. Archambeau-Mirguet, R. Peraldi, D. Monceau, Effect of Nitrogen on the Kinetics of Oxide Scale Growth and of Oxygen Dissolution in the Ti6242S Titanium-Based Alloy, Oxidation of Metals, 87 (2017) 343-353.
DOI: 10.1007/s11085-017-9729-1
Google Scholar
[14]
L. Baggetto, J. Esvan, C. Charvillat, D. Samélor, H. Vergnes, B. Caussat, A. Gleizes, C. Vahlas, Alumina thin films prepared by direct liquid injection chemical vapor deposition of dimethylaluminum isopropoxide: a process-structure investigation., Physica Status Solidi C, 12 (2015) 989-995.
DOI: 10.1002/pssc.201510009
Google Scholar
[15]
D. Monceau, D. Poquillon, Continuous thermogravimetry under cyclic conditions, Oxidation of Metals, 61 (2004) 143-163.
DOI: 10.1023/b:oxid.0000016281.25965.93
Google Scholar
[16]
W.C. Oliver, G.M. Pharr, An improved technique for determining hardness and elastic-modulus using load and displacement sensing indentation experiments., J. Mater. Res., 7 (1992) 1564-1583.
DOI: 10.1557/jmr.1992.1564
Google Scholar
[17]
L. Baggetto, C. Charvillat, Y. Thébault, J. Esvan, M.C. Lafont, E. Scheid, G.M. Veith, C. Vahlas, Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties, Phys. Stat. Sol. A, 213 (2016) 470–480.
DOI: 10.1002/pssa.201532838
Google Scholar