Effect of Dissolution on the Ni3Sn4 Growth Kinetics at the Interface of Ni and Liquid Sn-Base Solders

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Abstract:

The Ni3Sn4 intermetallic layer occurs at the interface of nickel and the saturated or undersaturated Sn-base solder melt at 250-450 °C and dipping times of 300 to 2400 s. Mathematical equations are proposed to evaluate the thickness of the Ni3Sn4 layer formed under conditions of simultaneous dissolution in the undersaturated solder melt.

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Periodical:

Solid State Phenomena (Volume 138)

Pages:

153-158

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Online since:

March 2008

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[1] M. Hansen: Constitution of Binary Alloys (McGraw-Hill, New-York, USA 1958).

Google Scholar

[2] K.P. Gurov, B.A. Kartashkin and Yu.E. Ugaste: Vzaimnaya Diffusiya v Mnogofaznikh Metallicheskikh Sistemakh (Nauka, Moskwa, Russia 1981).

Google Scholar

[3] V.I. Dybkov: Reaction Diffusion and Solid State Chemical Kinetics (The IPMS Publications, Kyiv, Ukraine 2002; http: /users. i. com. ua/~dybkov/V/).

Google Scholar

[4] K. Hauffe: Reaktionen in und an festen Stoffen (Springer, Berlin, Germany 1955).

Google Scholar

[5] W. Seith: Diffusion in Metallen (Springer, Berlin, Germany 1955).

Google Scholar

[6] J.A. Hedvall: Solid State Chemistry (Elsevier, Amsterdam, Holland 1966).

Google Scholar

[7] V.N. Chebotin: Fizicheskaya Khimiya Tverdogo Tela (Khimiya, Moskwa, Russia 1982).

Google Scholar

[8] H.J. Wallbaum: Naturwissenschaften Vol. 32 (1944), p.76.

Google Scholar

[9] V.I. Dybkov, K. Barmak, W. Lengauer and P. Gas: J. Alloy Compd. Vol. 389 (2005), p.61.

Google Scholar