High Temperature Effects on Harmonic Distortion in Submicron SOI Graded-Channel MOSFETs
p.67
p.67
Some Issues of Modeling the Double Barrier Metal-Oxide-Semiconductor Tunnel Structures
p.77
p.77
Electrical Properties of High-K LaLuO3 Gate Oxide for SOI MOSFETs
p.87
p.87
Effects of High–Energy Neutrons on Advanced SOI MOSFETs
p.95
p.95
Polysilicon on Insulator Structures for Sensor Application at Electron Irradiation & Magnetic Fields
p.109
p.109
On-Chip Tensile Testing of the Mechanical and Electro-Mechanical Properties of Nano-Scale Silicon Free-Standing Beams
p.117
p.117
Non-Standard FinFET Devices for Small Volume Sample Sensors
p.127
p.127
3D SOI Elements for System-on-Chip Applications
p.137
p.137
Routes towards Novel Active Pressure Sensors in SOI Technology
p.145
p.145
Polysilicon on Insulator Structures for Sensor Application at Electron Irradiation & Magnetic Fields
Abstract:
The effects of high energy electron irradiation and high magnetic fields (up to 14 T) on the electrical characteristics of recrystallized p-type polysilicon-on-insulator layers were studied. The aim of the paper is to obtain the material suitable to create the sensors operating in harsh conditions.
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Info:
Periodical:
Advanced Materials Research (Volume 276)
Pages:
109-116
Citation:
Online since:
July 2011
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