Safwat A. Mahmoud, Alshomer Shereen, Mou’ad A. Tarawnh
.
DOI: 10.4236/jmp.2011.210147   PDF    HTML   XML   9,134 Downloads   18,760 Views   Citations

Abstract

Crystalline and non-crystalline nickel oxide (NiO) thin films were obtained by spray pyrolysis technique (SPT) using nickel acetate tetrahydrate solutions onto glass substrates at different temperatures from 225 to 350℃. Structure of the as-deposited NiO thin films have been examined by X-ray diffraction (XRD) and atomic force microscope (AFM). The results showed that an amorphous structure of the films at low substrate temperature (T_s = 225℃), while at higher T_s ≥ 275℃, a cubic single phase structure of NiO film is formed. The refractive index (n) and the extinction coefficient (k) have been calculated from the corrected transmittance and reflectance measurements over the spectral range from 250 to 2400 nm. Some of the optical absorption parameters, such as optical dispersion energies, E_o and E_d, dielectric constant, ε, the average values of oscillator strength, S_o, wavelength of single oscillator λ_o and plasma frequency, ω_p, have been evaluated.

Keywords

Nickel Oxide Thin Films, Nickel Acetate, Optical Dispersion, Spray Pyrolysis Technique, AFM, XRD

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Conflicts of Interest

The authors declare no conflicts of interest.

References

[1]	D. Adler and J. J. Feinleib, “Electrical and Optical Properties of. Narrow-Band Materials,” Physical Review B, Vol. 2, No. 8, 1970, pp. 3112-3134. doi:10.1103/PhysRevB.2.3112
[2]	M. Z?llner, S. Kipp, and K. D. Becker, “Reactive Processes of Nickel Oxide on Oxidic Substrates as Observed by Scanning Force Microscopy,” Crystal Research and Technology, Vol. 35, No. 3, 2000, pp. 299-305. doi:10.1002/1521-4079(200003)35:3<299::AID-CRAT299>3.0.CO;2-I
[3]	E. J. M. O’Sullivan and E. J. Calvo, “Reactions at Metal Oxide Electrodes Comprehensive Chemical Kinetics” Elsevier, New York, 1987.
[4]	C. M. Lambert and G. Nazri, P. C. Yu, “Spectroscopic and Electrochemical Studies of Electrochromic Hydrated Nickel Oxide Films,” Solar Energy Materials, Vol. 16, 1987, pp. 1-17. doi:10.1016/0165-1633(87)90003-7
[5]	N. Shaigan, D.G. Ivey and W. Chen, “Metal-Oxide Scale Interfacial Imperfections and Performance of Stainless Steels Utilized as Interconnects in Solid Oxide Fuel Cells,” Journal of The Electrochemical Society, Vol. 156, No. 6, 2009, pp. B765-B770. doi:10.1149/1.3116252
[6]	K.K. Purushothaman and G. Muralidharan, “Nanostructured NiO Based All Solid State Electrochromic Device,” Journal of Sol-Gel Science and Technology, Vol. 46, 2008, pp. 190-197. doi:10.1007/s10971-007-1657-0
[7]	R. Cerc Korosec, P. Bukovec, B. Pihlar, A. Surca Vuk, B. Orel and G.Drazic,” Preparation and Structural Investigations of Electrochromic Nanosized NiOx Films Made via the Sol-Gel Route,” Solid State Ionics, Vol. 165, No. 1-4, 2003, pp. 191-200. doi:10.1016/j.ssi.2003.08.032
[8]	B. Sasi and K. G. Gopalchandran, “Nanostructured Mesoporous Nickel Oxide Thin Films,” Nanotechnology, Vol. 18, 2007, pp. 115613-115617.
[9]	H. Kamel, E. K. Elmaghraby, S. A. Ali and K. Abdel- Hady,” The Electrochromic Behavior of Nickel Oxide Films Sprayed at Different Preparative Conditions,” Thin Solid Films, Vol. 483, No. 1-2, 2005, pp. 330-339. doi:10.1016/j.tsf.2004.12.022
[10]	A. Mendoza-Galván, M. A. Vidales-Hurtado and A. M. López-Beltrán, “Comparison of the Optical and Structural Properties of Nickel Oxide-Based Thin Films Obtained by Chemical Bath and Sputtering,” Thin Solid Films, Vol. 517, No. 10, 2009, pp. 3115-3120. doi:10.1016/j.tsf.2008.11.094
[11]	I. Valyukh, S. Green, H. Arwin, G. A. Niklasson, E. W?ckelg?rd and C. G. Granqvist, “Spectroscopic Ellipsometry Characterization of Electrochromic Tungsten Oxide and Nickel Oxide Thin Films Made by Sputter Deposition,” Solar Energy Materials & Solar Cells, Vol. 94, 2010, pp. 724-733. doi:10.1016/j.solmat.2009.12.011
[12]	M.A. Vidales-Hurtado and A. Mendoza-Galv′an, “Optical and Structural Characterization of Nickel Oxide- Based Thin Films Obtained by Chemical Bath Deposition,” Materials Chemistry and Physics, Vol. 107, No. 1, 2008, pp. 33-38. doi:10.1016/j.matchemphys.2007.06.036
[13]	E. Ozkan Zayim, I. Turhan, F.Z. Tepehan and N. Ozer, “Sol-Gel Deposited Nickel Oxide Films for Electrochromic Applications,” Solar Energy Materials & Solar Cells, Vol. 92, 2008, pp. 164-196. doi:10.1016/j.solmat.2007.03.034
[14]	J. D. Desai, S.-K. Min, K.-D. Jung and O.-S. Joo, “Spray pyrolytic Synthesis of Large Area NiOx Thin Films from Aqueous Nickel Acetate Solutions,” Applied Surface Science, Vol. 253, 2006, pp. 1781-1788. doi:10.1016/j.apsusc.2006.03.009
[15]	R. Romero, F. Martin, J.R. Ramos-Barrado and D. Leinen, “Synthesis and Characterization of Nanostructured Nickel Oxide Thin Films Prepared with Chemical Spray Pyrolysis,” Thin Solid Films, Vol. 518, No. 16, 2010, pp. 4499- 4502. doi:10.1016/j.tsf.2009.12.016
[16]	A. Richter and R. Ries, “Surface Growth Modes Analysed with Modern Microscopic and Computing Techniques,” European Journal of Physics, Vol. 17, 1996, pp. 311-318. doi:10.1088/0143-0807/17/6/002
[17]	H. Kamal, E. K. Elmaghraby, S. A. Aly and K. Abdel-Hady, “Characterization of Nickel Oxide Films Deposited at Different Substrate Temperatures Using Spray Pyrolysis,” Journal of Crystal Growth, Vol. 262, No. 1-4, 2004, pp. 424-434. doi:10.1016/j.jcrysgro.2003.10.090
[18]	A. A. Al-Ghamdi, W. E. Mahmoud, S. J. Yaghmour and F. M. Al-Marzouki, “Structure and Optical Properties of Nanocrystalline NiO Thin Film Synthesized by Sol-Gel Spin-Coating Method,” Journal of Alloys and Compounds, Vol. 486, No. 1-2, 2009, pp. 9-13. doi:10.1016/j.jallcom.2009.06.139
[19]	S. A. Mahmoud, A. Akl, H. Kamal and K. Abdel-Hady, “Opto-Structural, Electrical and Electrochromic Properties of Crystalline Nickel Oxide Thin Films Prepared by Spray Pyrolysis,” Physica B, Vol. 311, No. 3-4, 2002, pp. 366-375. doi:10.1016/S0921-4526(01)01024-9
[20]	C. Navone, J.P. Pereira-Ramos, R. Baddour-Hadjean and R. Salot, “Electrochemical and Structural Properties of V2O5 Thin Films Prepared by DC Sputtering,” Journal of Power Sources, Vol. 146, 2005,pp. 327-330. doi:10.1016/j.jpowsour.2005.03.024
[21]	J. Tauc, “Amorphous and Liquid Semiconductors,” Plenum Press, New York, 1974.
[22]	S. A. Mahmoud, A. A. Akl, and S. M. Al-Shomar, “Preparative Parameters-Dependent Optical Properties of Spray Deposited Iridium Oxide Thin Films,” Physica B, Vol. 404, No. 16, 2009, pp. 2151-2158. doi:10.1016/j.physb.2009.04.003
[23]	C. Shi, G. Wang, N. Zhao, X. Du and J. Li, “ NiO Nanotubes Assembled in Pores of Porous Anodic Alumina and Their Optical Absorption Properties,” Chemical Physics Letters, Vol. 454, 2008, pp. 75-79. doi:10.1016/j.cplett.2008.01.069
[24]	S. A. Mahmoud, “Structural and Physical Properties of Sprayed SnO2 Films Doped with Flurine,” Egyptian Journal of Solids, Vol. 19, 1996, pp. 221-228.
[25]	J. N. Zemel, J. D. Jensen and R. B. Schoolar, “Electrical and Optical Properties of Epitaxial Films of PbS, PbSe, PbTe, and SnTe,” Physical Review A, Vol. 140, 1965, pp. 330-335. doi:10.1103/PhysRev.140.A330
[26]	M. B. El-Den and M. M. El-Nahass, “Optical Properties of AsSe1.5?xTx Glassy System,” Optics & Laser Technology, Vol. 35, No. 5, 2003, pp. 335-340. doi:10.1016/S0030-3992(03)00008-2
[27]	M. G. Hutchins, O. Abu-Alkhair, M. M. El-Nahass and K. Abdel-Hady, “Structural and Optical Characterisation of Thermally Evaporated Tungsten Trioxide (WO3) Thin Films,” Materials Chemistry and Physics, Vol. 98, No. 2-3, 2006, pp. 401-405. doi:10.1016/j.matchemphys.2005.09.052
[28]	M. M. El-Nahass, A. M. Farag, K. F. Abd El-Rahman and A. A. A. Darwish, “Dispersion Studies and Electronic Transitions in Nickel Phthalocyanine Thin Films,” Optics & Laser Technology, Vol. 37, No. 7, 2005, pp. 513-523. doi:10.1016/j.optlastec.2004.08.016
[29]	M. M. El-Nahass, M. M. Sallam and A. H. S. Abdel- Wahab, “Optical and Photoelectric Properties of TlInS2 Layered Single Crystals,” Current Applied Physics, Vol. 9, 2009, pp. 311-316. doi:10.1016/j.cap.2008.02.011
[30]	M. Baleva, E. Goranova, V. Darakchieva, S. Kossionides, M. Kokkosis and P. Jordanov, “Influence of Grain Size on the Optical Conductivity of β-FeSi2 Layers,” Vacuum, Vol. 69, No. 1, 2002, pp. 425-429. doi:10.1016/S0042-207X(02)00369-X
[31]	V. Darakchieva, M. Baleva, M. Surtchey and E. Goranova, “Structural and Optical Analysis of β-FeSi2 Thin Layers Prepared by Ion-Beam Synthesis and Solid-State Reaction,” Physical Review B, Vol. 62, 2000, pp. 13057- 13059. doi:10.1103/PhysRevB.62.13057
[32]	T. S. Moss, “Optical Properties of Semiconductors,” Butterworth’s Scientific Publication LTD., London, 1959.
[33]	E. M. Assim, “Optical Constants of TiO1.7 Thin Films Deposited by Electron Beam Gun,” Journal of Alloys Compounds, Vol. 463, No. 1, 2008, pp. 55-61. doi:10.1016/j.jallcom.2007.09.034
[34]	M. Caglar, S. Ilican, Y. Calgan, Y. Sahin, F. Yakuphanoglu and D. Hur, “A Spectro Electrochemical Study on Single- Oscillator Model and Optical Constants of Sulfonated Polyaniline Film,” Spectrochimica Acta A, Vol. 71, No. 2, 2008, pp. 621-627. doi:10.1016/j.saa.2008.01.022
[35]	S. H. Wemple and M. DiDomenco, “Behavior of the Electronic Dielectric Constant in Covalent and Ionic Materials,” Physical Review B, Vol. 3, 1971, pp. 1338-1342. doi:10.1103/PhysRevB.3.1338
[36]	M. M. Abdel-Aziz, E. G. El-Metwally, M. Fadel, H. H. Labib and M. A. Afifi,” Optical Properties of Amorphous Ge—Se—Tl System Films,” Thin Solid Films, Vol. 386, No. 1, 2000, pp. 99-104. doi:10.1016/S0040-6090(01)00765-9
[37]	K. Tanaka, “Optical Properties and Photoinduced Changes in Amorphous As-S Films,” Thin Solid Films, Vol. 66, No. 3, 1980, pp. 271-279. doi:10.1016/0040-6090(80)90381-8