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Erschienen in: Journal of Materials Science: Materials in Electronics 23/2018

09.10.2018

Macroscopic effects and microscopic origins of gamma-ray irradiation on In-doped CdZnTe crystal

verfasst von: Ruihua Nan, Tao Li, Zengyun Jian, Gang Xu, Xiaojuan Li

Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 23/2018

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Abstract

The effects of gamma-ray irradiation, exposed to a 60Co source with a dose of 2.7 kGy, on In-doped CdZnTe (CdZnTe:In) crystal were investigated. We combined the “macroscopic” electrical properties of CdZnTe:In sample, evaluated by current–voltage (I–V) measurements at different temperature, with the “microscopic” origins of electrically active defects induced by gamma-irradiation, characterized by thermally stimulated current spectroscopy. It reveals that the bulk resistivity at room temperature have increased from 2.7 × 109 Ω cm for the as-grown CdZnTe:In sample to 5.9 × 109 Ω cm for the irradiated sample. Since the microscopic origins of these macroscopic effects are linked to the electrically active defects within the material, five main defect states (I, II, III, IV and V) were characterized and identified in the CdZnTe:In crystal. In particular, the introduction of gamma-irradiation altered the trap concentrations of these defect states, such as the rapidly decreasing concentration of region I. Besides, the gamma-ray irradiation caused a further deepening of EDD level (region V) from the value of 0.717 ± 0.004 eV for the as-grown sample to the value of 0.749 ± 0.004 eV for the irradiated sample. The microscopic origin of EDD level was identified with TeCd2+ below the conduction band minimum, which is responsible for the pinning of EF level near the mid-gap, and thus for the observed high-resistivity performance of CdZnTe:In.

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Metadaten
Titel
Macroscopic effects and microscopic origins of gamma-ray irradiation on In-doped CdZnTe crystal
verfasst von
Ruihua Nan
Tao Li
Zengyun Jian
Gang Xu
Xiaojuan Li
Publikationsdatum
09.10.2018
Verlag
Springer US
Erschienen in
Journal of Materials Science: Materials in Electronics / Ausgabe 23/2018
Print ISSN: 0957-4522
Elektronische ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-018-0180-0

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