Ausgabe 10-11/2014 Special Issue: The 10th International Workshop on High Aspect Ratio Micro and Nanosystem Technologies (HARMNST), Berlin, April 21-24, 2013
Inhalt (50 Artikel)
Nanoimprint lithography and micro-embossing in LiGA technology: similarities and differences
- Technical Paper
Helmut Schift
SAM meets MEMS: reliable fabrication of stable Au-patterns embedded in PDMS using dry peel-off process
- Technical Paper
Ikjoo Byun, Anthony W. Coleman, Beomjoon Kim
ViPER: simulation software for high aspect ratio plasma etching of silicon
- Technical Paper
Valentyn Ishchuk, Burkhard E. Volland, Ivo W. Rangelow
High-aspect-ratio nanoporous membranes made by reactive ion etching and e-beam and interference lithography
- Technical Paper
Ralu Divan, Olga V. Makarova, Shelby Skoog, Roger Narayan, Anirudha V. Sumant, Cha-Mei Tang, Nicolaie Moldovan
IR-drying of photoresists: experimental and theoretical consideration of drying kinetics of mono- and multi-layered coatings
- Technical Paper
M. Schönfeld, S. Schubert, J. Saupe, J. Grimm
Large tuning ratio high aspect ratio variable capacitors using leveraged bending
- Technical Paper
S. Achenbach, D. T. Haluzan, D. M. Klymyshyn, M. Börner, J. Mohr
Arrays of high-aspect ratio microchannels for high-throughput isolation of circulating tumor cells (CTCs)
- Technical Paper
Mateusz L. Hupert, Joshua M. Jackson, Hong Wang, Małgorzata A. Witek, Joyce Kamande, Matthew I. Milowsky, Young E. Whang, Steven A. Soper
Fabrication of porous anodic aluminum oxide by hybrid pulse anodization at relatively high potential
- Technical Paper
C. K. Chung, M. W. Liao, O. K. Khor
2N Period submicron grating at the inner wall of a metal cylinder
- Technical Paper
H. Hirshy, S. G. Scholz, Y. Jourlin, S. Tonchev, S. Reynaud, A. Boukenter, O. Parriaux
Advanced mask aligner lithography (AMALITH) for thick photoresist
- Technical Paper
Reinhard Voelkel, Uwe Vogler, Arianna Bramati, Marc Hennemeyer, Ralph Zoberbier, Anja Voigt, Gabi Grützner, Nezih Ünal, Ulrich Hofmann
Design and fabrication of microlens arrays as beam relay for free-space optical interconnection
- Technical Paper
Zhengyu Miao, Wanjun Wang
High aspect ratio gold nanopillars on microelectrodes for neural interfaces
- Technical Paper
C. Nick, S. Quednau, R. Sarwar, H. F. Schlaak, C. Thielemann
Ferroelectric thin film fabrication by direct UV-lithography
- Technical Paper
Manuel Benkler, F. Paul, J. Schott, T. Hanemann
Fabrication of a high aspect ratio (HAR) micropillar filter for a magnetic bead-based immunoassay
- Technical Paper
C. Ruffert, Q. Ramadan, M. A. M. Gijs
Microstructuring of non-conductive silicon carbide by electrical discharge machining
- Technical Paper
Florian Zeller, Tim Hösel, Claas Müller, Holger Reinecke
A Monte Carlo study of the primary absorbed energy redistribution in X-ray lithography
- Technical Paper
P. Meyer, F. J. Pantenburg
Challenges with high aspect ratio nanoimprint
- Technical Paper
Hella-Christin Scheer, A. Mayer, K. Dhima, S. Wang, C. Steinberg
Evaluation of Young’s modulus of imprinted hydrogen silsesquioxane pillar after residual layer removal by reactive ion etching
- Technical Paper
Yuji Kang, Yuichi Haruyama, Shinji Matsui
Rapid soda-lime glass etching process for producing microfluidic channels with higher aspect ratio
- Technical Paper
Che-Hsin Lin, Kuan-Wei Chen, Tang-Yu Li
Micro porous polymer foil for application in evaporation cooling
- Technical Paper
Evelyn Drabiniok, Andreas Neyer
Rapid-manufacturing of micro-structured devices based on MWCNTs/PP composites by using hot embossing replication process
- Technical Paper
Jie Zhang, Mohamed Sahli, Jean-Claude Gelin, Chantal Khan-Malek
Low cost method for hot embossing of microstructures on PMMA by SU-8 masters
- Technical Paper
Alireza Shamsi, Ali Amiri, Payam Heydari, Hasan Hajghasem, Mansour Mohtashamifar, Mehrnaz Esfandiari
Rapid and low cost replication of complex microfluidic structures with PDMS double casting technology
- Technical Paper
Luxia Yang, Xiaojian Hao, Chunshui Wang, Binzhen Zhang, Wanjun Wang
Nano-microscale moulding of some metal plates with high strength Ni–W alloy moulds
- Technical Paper
Tohru Yamasaki, Masahiro Yamada, Hiroki Adachi, Takayuki Nabeshima, Yoshihiko Yokoyama
High-aspect-ratio nanoimprinted structures for a multi-pole magnetic scale
- Technical Paper
Zhi-Hao Xu, Chien-Li Wu, Cheng-Kuo Sung, Sheng-Ching Wang, Tsung-Shune Chin
“LIGA2.X” process for mass production of single polymeric LIGA micro parts
- Technical Paper
J. Heneka, M. Guttmann, K. Plewa, J. Mohr, T. Hanemann, V. Saile
Direct imprinting of organic–inorganic hybrid materials into high aspect ratio sub-100 nm structures
- Technical Paper
V. J. Cadarso, T. Kiefer, V. Auzelyte, H. Atasoy, G. Gruetzner, J. Brugger
Hot embossing of transparent high aspect ratio micro parts
- Technical Paper
A. Kolew, M. Heilig, M. Schneider, D. Münch, R. Ezzat, N. Schneider, M. Worgull
Mechanical material characterization of photosensitive polymers
- Technical Paper
J. Vogel, H.-J. Feige, J. Saupe, S. Schubert, J. Grimm
Simulation and fabrication of a branch-channel rhombic micromixer for low pressure drop and short mixing length
- Technical Paper
C. K. Chung, C. K. Chang, C. C. Lai
Application of metal film protection to microfluidic chip fabrication using CO2 laser ablation
- Technical Paper
C. K. Chung, K. Z. Tu
Fabrication of gold nanoparticle pattern using imprinted hydrogen silsesquioxane pattern for surface-enhanced Raman scattering
- Technical Paper
Yuji Kang, Takao Fukuoka, Ryo Takahashi, Yuichi Utsumi, Yuichi Haruyama, Shinji Matsui
Replication of sub-100 nm structures using h- and s-PDMS composite stamps
- Technical Paper
Christoph Huelsen, Juergen Probst, Bernd Loechel
Fabrication of micro pore optics with smooth sidewall using X-ray lithography
- Technical Paper
Tianchong Zhang, Futing Yi, Bo Wang, Jing Liu, Marina Ashmkhan, Xinshuai Zhang
Replication processes for metal and ceramic micro parts
- Technical Paper
Volker Piotter, E. Honza, A. Klein, T. Mueller, K. Plewa, J. Prokop
Infrared heated μ-blistering, a new fabrication technology for HARMST
- Technical Paper
Thomas Schmidt, Claas Mueller, Holger Reinecke
Characterization method for new resist formulations for HAR patterns made by X-ray lithography
- Technical Paper
Danays Kunka, Jürgen Mohr, Vladimir Nazmov, Jan Meiser, Pascal Meyer, Maximilian Amberger, Frieder Koch, Joachim Schulz, Marco Walter, Thomas Duttenhofer, Anja Voigt, Gisela Ahrens, Gabi Grützner
LIGA micro-openings for coherence characterization of X-rays
- Technical Paper
V. Nazmov, M. Kluge, A. Last, F. Marschall, J. Mohr, H. Vogt, R. Simon
Photo-lithographic patterning of biomimetic molecularly imprinted polymer thin films onto silicon wafers
- Technical Paper
Reinhard I. Boysen, Lachlan J. Schwarz, Shuyan Li, Jamil Chowdhury, Milton T. W. Hearn
X-ray zone plates with 25 aspect ratio using a 2-μm-thick ultrananocrystalline diamond mold
- Technical Paper
Michael J. Wojcik, Derrick C. Mancini, Ralu Divan, Leonidas E. Ocola
3D nanometer features by ultra precision machining
- Technical Paper
Kurt Haskic, Stefan Kühne, Bernd Löchel, Martin Schmidt
Development of high aspect ratio X-ray parabolic compound refractive lens at Indus-2 using X-ray lithography
- Technical Paper
V. P. Dhamgaye, M. K. Tiwari, C. K. Garg, P. Tiwari, K. J. S. Sawhney, G. S. Lodha
Status of laminar grating manufacturing via lithography at HZB
- Technical Paper
S. Lemke, T. Seliger, I. Rudolph, O. Kutz, Ph. Goettert, B. Nelles, F. Senf, B. Loechel
Orthogonal and fine lithographic structures attained from the next generation proton beam writing facility
- Technical Paper
Y. Yao, P. Santhana Raman, J. A. van Kan
Fabrication and characterization of polymer microprisms
- Technical Paper
William Brian Derek Forfang, Timothy Glenn Conner, Byoung Hee You, Taehyun Park, In-Hyouk Song
Resist evaluation for proton beam writing, Ni mold fabrication and nano-replication
- Technical Paper
Y. H. Wang, P. Malar, J. A. van Kan
Potential of BPN as a new negative photoresist for a very thick layer with high aspect ratio
- Technical Paper
David Bourrier, A. Ghannam, M. Dilhan, H. Granier
High aspect ratio submicrometer two-dimensional structures fabricated by one-photon absorption direct laser writing
- Technical Paper
Mai Trang Do, Qinggele Li, Thi Thanh Ngan Nguyen, Henri Benisty, Isabelle Ledoux-Rak, Ngoc Diep Lai
Fabrication and characterization of machined 3D diffractive optical elements
- Technical Paper
Stefan Kühne, Kurt Haskic, Stephanie Lemke, Martin Schmidt
