2006 | OriginalPaper | Buchkapitel
Nanocrystalline Cubic Boron Nitride Films
verfasst von : Regine Freudenstein, Wilhelm Kulisch
Erschienen in: Functional Properties of Nanostructured Materials
Verlag: Springer Netherlands
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A concept for the deposition of thick, well-adherent cubic boron nitride thin films is presented. It takes into account the pecularities of c-BN deposition, i.e. the unique nucleation and growth sequence, the well-defined parameter spaces for nucleation and growth, and the differences between the two steps. Our concept includes measures to improve the adhesion during the nucleation step, e.g. by gradient interlayers, and to reduce the stress during the subsequent growth by appropriate parameter selection. It results in the deposition of well-adherent, stable c-BN films of several hundred nm thickness.