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Erschienen in: Journal of Sol-Gel Science and Technology 3/2018

14.02.2018 | Original Paper: Sol-gel and hybrid materials for dielectric, electronic, magnetic and ferroelectric applications

Novel adamantane-based periodic mesoporous organosilica film with ultralow dielectric constant and high mechanical strength

verfasst von: Guoping Zhang, Jiawei Zhang, Fangfang Niu, Fan Zhang, Songfang Zhao, Mingliang Wang, Yongju Gao, Rong Sun, Chingping Wong

Erschienen in: Journal of Sol-Gel Science and Technology | Ausgabe 3/2018

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Abstract

In this work, a novel bridged organosilane precursor, adamantane-bridged organosilane (ADBO), was synthesized successfully which was employed to prepare adamantane-based (ADH-based) periodic mesoporous organosilica (PMO) thin film in the presence of porogen and acid catalyst via evaporation-induced self-assembly (EISA) after spin-coating procedure. The resultant ADH-based PMO thin films were characterized by FTIR, NMR, TEM, and small-angle XRD. The ADH-based PMO thin film with weight ratio of porogen to ADBO (0.75:1) possesses low dielectric constant (1.55 ± 0.04@1 MHz), excellent Young’s modulus (6.69 ± 0.54 GPa), and ideal hydrophobic property (90.2° of water contact angle) simultaneously. These outstanding properties of ADH-based PMO film can be ascribed to lower polarity, lower density, and rigid cavity structure of adamantane, which suggests its potential application as high-performance low-κ material in next-generation microelectronics.

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Metadaten
Titel
Novel adamantane-based periodic mesoporous organosilica film with ultralow dielectric constant and high mechanical strength
verfasst von
Guoping Zhang
Jiawei Zhang
Fangfang Niu
Fan Zhang
Songfang Zhao
Mingliang Wang
Yongju Gao
Rong Sun
Chingping Wong
Publikationsdatum
14.02.2018
Verlag
Springer US
Erschienen in
Journal of Sol-Gel Science and Technology / Ausgabe 3/2018
Print ISSN: 0928-0707
Elektronische ISSN: 1573-4846
DOI
https://doi.org/10.1007/s10971-018-4582-5

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