Skip to main content
Erschienen in: Microsystem Technologies 5/2016

20.05.2015 | Technical Paper

Optimization of the profile of the nano-mold and the imprinting conditions by numerical simulation method

verfasst von: Zhifu Yin, Lei Sun, Helin Zou, Shenbo Xu

Erschienen in: Microsystem Technologies | Ausgabe 5/2016

Einloggen

Aktivieren Sie unsere intelligente Suche, um passende Fachinhalte oder Patente zu finden.

search-config
loading …

Abstract

The profile of the nano-mold can also influence the replication precision of the final 2D polymer nanochannels. In the present work, the aspect ratio of the nano-mold, the duty ratio of the nano-mold, and the thickness ratio were investigated by numerical simulation method. The replication precision of the 2D polymer nanochannels is evaluated by imprinting ratio. The simulation results show that the lower aspect ratio and duty ratio is associated with higher imprinting ratio. However, the imprinting ratio increases with the thickness ratio at beginning and then keeps nearly unchanged as the thickness ratio continuously increases. The proper thickness ratio is two. The imprinting temperature and pressure were also optimized according the imprinting ratio. The simulation results show that the optimal imprinting temperature and pressure were 120 °C and 1.5 MPa, respectively.

Sie haben noch keine Lizenz? Dann Informieren Sie sich jetzt über unsere Produkte:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Literatur
Zurück zum Zitat Chantiwas R, Hupert ML, Pullagurla SR, Balamurugan S, Tamarit-Lopez J, Park S, Datta P, Goettert J, Cho Y-K, Soper SA (2010) Simple replication methods for producing nanoslits in thermoplastics and the transport dynamics of double-stranded DNA through these slits. Lab Chip 10(23):3255–3264CrossRef Chantiwas R, Hupert ML, Pullagurla SR, Balamurugan S, Tamarit-Lopez J, Park S, Datta P, Goettert J, Cho Y-K, Soper SA (2010) Simple replication methods for producing nanoslits in thermoplastics and the transport dynamics of double-stranded DNA through these slits. Lab Chip 10(23):3255–3264CrossRef
Zurück zum Zitat Cho B, Kim K, Won T (2012) Finite element method simulation of the molding process for thermal nano-imprint lithography. J Nanosci Nanotechnol 12(7):5759–5762CrossRef Cho B, Kim K, Won T (2012) Finite element method simulation of the molding process for thermal nano-imprint lithography. J Nanosci Nanotechnol 12(7):5759–5762CrossRef
Zurück zum Zitat Choo B-K, Choi J-S, Kim S-W, Park K-C, Jang J (2006) Fabrication of amorphous silicon thin-film transistor by micro imprint lithography. J Non-Cryst Solids 352(9–20):1704–1707CrossRef Choo B-K, Choi J-S, Kim S-W, Park K-C, Jang J (2006) Fabrication of amorphous silicon thin-film transistor by micro imprint lithography. J Non-Cryst Solids 352(9–20):1704–1707CrossRef
Zurück zum Zitat Chou SY, Krauss PR, Renstrom PJ (1996) Imprint lithography with 25-nanometer resolution. Science 272(5258):85–87CrossRef Chou SY, Krauss PR, Renstrom PJ (1996) Imprint lithography with 25-nanometer resolution. Science 272(5258):85–87CrossRef
Zurück zum Zitat Falconnet D, Pasqui D, Park S, Eckert R, Schift H, Gobrecht J, Barbucci R, Textor M (2004) A novel approach to produce protein nanopatterns by combining nanoimprint lithography and molecular self-assembly. Nano Lett 4(10):1909–1914CrossRef Falconnet D, Pasqui D, Park S, Eckert R, Schift H, Gobrecht J, Barbucci R, Textor M (2004) A novel approach to produce protein nanopatterns by combining nanoimprint lithography and molecular self-assembly. Nano Lett 4(10):1909–1914CrossRef
Zurück zum Zitat Gaidys R, Narijauskaite B, Palevicius A and Janusas G (2012). Numerical simulation of hot imprint process of periodical lamellar microstructure into polycarbonate. Conference on Micromachining and Microfabrication Process Technology XVII San Francisco, CA Gaidys R, Narijauskaite B, Palevicius A and Janusas G (2012). Numerical simulation of hot imprint process of periodical lamellar microstructure into polycarbonate. Conference on Micromachining and Microfabrication Process Technology XVII San Francisco, CA
Zurück zum Zitat Guo LJ (2004) Recent progress in nanoimprint technology and its applications. J Phys D-Appl Phys 37(11):R123–R141CrossRef Guo LJ (2004) Recent progress in nanoimprint technology and its applications. J Phys D-Appl Phys 37(11):R123–R141CrossRef
Zurück zum Zitat Hasko D, Kovac J, Satka A, Drzik M, Uherek F, Hubbard G and Allsopp DWE (2008). Structural and optical characterization of photonics structures prepared by nanoimprint technology. In: P. Tomanek, D. Senderakova, M. Hrabovsky Photonics, Devices, and Systems IV, p 7138 Hasko D, Kovac J, Satka A, Drzik M, Uherek F, Hubbard G and Allsopp DWE (2008). Structural and optical characterization of photonics structures prepared by nanoimprint technology. In: P. Tomanek, D. Senderakova, M. Hrabovsky Photonics, Devices, and Systems IV, p 7138
Zurück zum Zitat Hirai Y, Onishi Y, Tanabe T, Shibata M, Iwasaki T, Iriye Y (2008) Pressure and resist thickness dependency of resist time evolutions profiles in nanoimprint lithography. Microelectron Eng 85(5–6):842–845CrossRef Hirai Y, Onishi Y, Tanabe T, Shibata M, Iwasaki T, Iriye Y (2008) Pressure and resist thickness dependency of resist time evolutions profiles in nanoimprint lithography. Microelectron Eng 85(5–6):842–845CrossRef
Zurück zum Zitat Hocheng H, Nien CC (2006) Numerical analysis of effects of mold features and contact friction on cavity filling in the nanoimprinting process. J Micro-Nanolith Mem 5(1):011004CrossRef Hocheng H, Nien CC (2006) Numerical analysis of effects of mold features and contact friction on cavity filling in the nanoimprinting process. J Micro-Nanolith Mem 5(1):011004CrossRef
Zurück zum Zitat Jeong WY, An SK (2003) Seam characteristics of breathable waterproof fabrics with various finishing methods. Fibers Polym 4(2):71–76CrossRef Jeong WY, An SK (2003) Seam characteristics of breathable waterproof fabrics with various finishing methods. Fibers Polym 4(2):71–76CrossRef
Zurück zum Zitat JiHyeong R, HyungJun L, Mira J, JaeJong L (2012) A study of contact angles according to the resist thickness and imprint time effects during NIL. Microelectron Eng 98:210–213CrossRef JiHyeong R, HyungJun L, Mira J, JaeJong L (2012) A study of contact angles according to the resist thickness and imprint time effects during NIL. Microelectron Eng 98:210–213CrossRef
Zurück zum Zitat Johansson F, Carlberg P, Danielsen N, Montelius L, Kanje M (2006) Axonal outgrowth on nano-imprinted patterns. Biomaterials 27(8):1251–1258CrossRef Johansson F, Carlberg P, Danielsen N, Montelius L, Kanje M (2006) Axonal outgrowth on nano-imprinted patterns. Biomaterials 27(8):1251–1258CrossRef
Zurück zum Zitat Krauss PR, Chou SY (1997) Nano-compact disks with 400 Gbit/in(2) storage density fabricated using nanoimprint lithography and read with proximal probe. Appl Phys Lett 71(21):3174–3176CrossRef Krauss PR, Chou SY (1997) Nano-compact disks with 400 Gbit/in(2) storage density fabricated using nanoimprint lithography and read with proximal probe. Appl Phys Lett 71(21):3174–3176CrossRef
Zurück zum Zitat Lan S, Lee HJ, Lee SH, Ni J, Lai X, Lee HW, Song JH, Lee MG (2009) Experimental and numerical study on the viscoelastic property of polycarbonate near glass transition temperature for micro thermal imprint process. Mater Des 30(9):3879–3884CrossRef Lan S, Lee HJ, Lee SH, Ni J, Lai X, Lee HW, Song JH, Lee MG (2009) Experimental and numerical study on the viscoelastic property of polycarbonate near glass transition temperature for micro thermal imprint process. Mater Des 30(9):3879–3884CrossRef
Zurück zum Zitat Nagarajan P, Yao D (2011) Uniform shell patterning using rubber-assisted hot embossing process II. Process analysis. Polym Eng Sci 51(3):601–608CrossRef Nagarajan P, Yao D (2011) Uniform shell patterning using rubber-assisted hot embossing process II. Process analysis. Polym Eng Sci 51(3):601–608CrossRef
Zurück zum Zitat Pedersen JN, Marie R, Bauer DLV, Rasmussen KH, Yusuf M, Volpi EV, Kristensen A, Mir KU, Flyvbjerg H (2013) Fully streched single DNA molecules in a nanofluidic chip show large-scale structural variation. Biophys J 104(2):175ACrossRef Pedersen JN, Marie R, Bauer DLV, Rasmussen KH, Yusuf M, Volpi EV, Kristensen A, Mir KU, Flyvbjerg H (2013) Fully streched single DNA molecules in a nanofluidic chip show large-scale structural variation. Biophys J 104(2):175ACrossRef
Zurück zum Zitat Rowland HD, Sun AC, Schunk PR, King WP (2005) Impact of polymer film thickness and cavity size on polymer flow during embossing: toward process design rules for nanoimprint lithography. J Micromech Microeng 15(12):2414–2425CrossRef Rowland HD, Sun AC, Schunk PR, King WP (2005) Impact of polymer film thickness and cavity size on polymer flow during embossing: toward process design rules for nanoimprint lithography. J Micromech Microeng 15(12):2414–2425CrossRef
Zurück zum Zitat Sakamoto J, Fujikawa N, Nishikura N, Kawata H, Yasuda M, Hirai Y (2011) High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography. J Vac Sci Technol B 29(6):06FC15CrossRef Sakamoto J, Fujikawa N, Nishikura N, Kawata H, Yasuda M, Hirai Y (2011) High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography. J Vac Sci Technol B 29(6):06FC15CrossRef
Zurück zum Zitat Scheer H-C, Mayer A, Dhima K, Wang S, Steinberg C (2014) Challenges with high aspect ratio nanoimprint. Microsyst Technol 20(10–11):1891–1898CrossRef Scheer H-C, Mayer A, Dhima K, Wang S, Steinberg C (2014) Challenges with high aspect ratio nanoimprint. Microsyst Technol 20(10–11):1891–1898CrossRef
Zurück zum Zitat Song Z, Choi J, You BH, Lee J, Park S (2008) Simulation study on stress and deformation of polymeric patterns during the demolding process in thermal imprint lithography. J Vac Sci Technol B 26(2):598–605CrossRef Song Z, Choi J, You BH, Lee J, Park S (2008) Simulation study on stress and deformation of polymeric patterns during the demolding process in thermal imprint lithography. J Vac Sci Technol B 26(2):598–605CrossRef
Zurück zum Zitat Soper SA, Brown K, Ellington A, Frazier B, Garcia-Manero G, Gau V, Gutman SI, Hayes DF, Korte B, Landers JL, Larson D, Ligler F, Majumdar A, Mascini M, Nolte D, Rosenzweig Z, Wang J, Wilson D (2006) Point-of-care biosensor systems for cancer diagnostics/prognostics. Biosens Bioelectron 21(10):1932–1942CrossRef Soper SA, Brown K, Ellington A, Frazier B, Garcia-Manero G, Gau V, Gutman SI, Hayes DF, Korte B, Landers JL, Larson D, Ligler F, Majumdar A, Mascini M, Nolte D, Rosenzweig Z, Wang J, Wilson D (2006) Point-of-care biosensor systems for cancer diagnostics/prognostics. Biosens Bioelectron 21(10):1932–1942CrossRef
Zurück zum Zitat Takagi H, Takahashi M, Maeda R, Onishi Y, Iriye Y, Iwasaki T, Hirai Y (2008) Experimental and numerical analyses on recovery of polymer deformation after demolding in the hot embossing process. J Vac Sci Technol B 26(6):2399–2403CrossRef Takagi H, Takahashi M, Maeda R, Onishi Y, Iriye Y, Iwasaki T, Hirai Y (2008) Experimental and numerical analyses on recovery of polymer deformation after demolding in the hot embossing process. J Vac Sci Technol B 26(6):2399–2403CrossRef
Zurück zum Zitat Thamdrup LH, Klukowska A, Kristensen A (2008) Stretching DNA in polymer nanochannels fabricated by thermal imprint in PMMA. Nanotechnology 19(12):125301CrossRef Thamdrup LH, Klukowska A, Kristensen A (2008) Stretching DNA in polymer nanochannels fabricated by thermal imprint in PMMA. Nanotechnology 19(12):125301CrossRef
Zurück zum Zitat Wu J, Chantiwas R, Amirsadeghi A, Soper SA, Park S (2011) Complete plastic nanofluidic devices for DNA analysis via direct imprinting with polymer stamps. Lab Chip 11(17):2984–2989CrossRef Wu J, Chantiwas R, Amirsadeghi A, Soper SA, Park S (2011) Complete plastic nanofluidic devices for DNA analysis via direct imprinting with polymer stamps. Lab Chip 11(17):2984–2989CrossRef
Zurück zum Zitat Xia Q, Robinett W, Cumbie MW, Banerjee N, Cardinali TJ, Yang JJ, Wu W, Li X, Tong WM, Strukov DB, Snider GS, Medeiros-Ribeiro G, Williams RS (2009) Memristor-CMOS Hybrid Integrated Circuits for Reconfigurable Logic. Nano Lett 9(10):3640–3645CrossRef Xia Q, Robinett W, Cumbie MW, Banerjee N, Cardinali TJ, Yang JJ, Wu W, Li X, Tong WM, Strukov DB, Snider GS, Medeiros-Ribeiro G, Williams RS (2009) Memristor-CMOS Hybrid Integrated Circuits for Reconfigurable Logic. Nano Lett 9(10):3640–3645CrossRef
Zurück zum Zitat Yasuda M, Araki K, Taga A, Horiba A, Kawata H, Hirai Y (2011) Computational study on polymer filling process in nanoimprint lithography. Elsevier, Amsterdam Yasuda M, Araki K, Taga A, Horiba A, Kawata H, Hirai Y (2011) Computational study on polymer filling process in nanoimprint lithography. Elsevier, Amsterdam
Zurück zum Zitat Yin Z, Cheng E, Zou H (2014a) A novel hybrid patterning technique for micro and nanochannel fabrication by integrating hot embossing and inverse UV photolithography. Lab Chip 14(9):1614–1621CrossRef Yin Z, Cheng E, Zou H (2014a) A novel hybrid patterning technique for micro and nanochannel fabrication by integrating hot embossing and inverse UV photolithography. Lab Chip 14(9):1614–1621CrossRef
Zurück zum Zitat Yin Z, Cheng E, Zou H, Chen L, Xu S (2014b) Fabrication of two dimensional polyethylene terephthalate nanofluidic chip using hot embossing and thermal bonding technique. Biomicrofluidics 8(6):066503CrossRef Yin Z, Cheng E, Zou H, Chen L, Xu S (2014b) Fabrication of two dimensional polyethylene terephthalate nanofluidic chip using hot embossing and thermal bonding technique. Biomicrofluidics 8(6):066503CrossRef
Zurück zum Zitat Zosel A (1985) Adhesion and tack of polymers—influence of mechanical-properties and surface tensions. Colloid Polym Sci 263(7):541–553CrossRef Zosel A (1985) Adhesion and tack of polymers—influence of mechanical-properties and surface tensions. Colloid Polym Sci 263(7):541–553CrossRef
Metadaten
Titel
Optimization of the profile of the nano-mold and the imprinting conditions by numerical simulation method
verfasst von
Zhifu Yin
Lei Sun
Helin Zou
Shenbo Xu
Publikationsdatum
20.05.2015
Verlag
Springer Berlin Heidelberg
Erschienen in
Microsystem Technologies / Ausgabe 5/2016
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-015-2564-x

Weitere Artikel der Ausgabe 5/2016

Microsystem Technologies 5/2016 Zur Ausgabe

Neuer Inhalt