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2014 | OriginalPaper | Buchkapitel

8. Other Epitaxial Oxides on Semiconductors

verfasst von : Alexander A. Demkov, Agham B. Posadas

Erschienen in: Integration of Functional Oxides with Semiconductors

Verlag: Springer New York

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Abstract

The success of integrating perovskites on Si(001) has also stimulated work on developing growth processes for other oxide materials, other crystallographic orientations, and even other semiconductor substrates. A review of the current work is summarized in this chapter, including efforts at growing the opposite stack of semiconductors on oxide surfaces. Work on the epitaxial integration of oxides on Si(111), Ge, GaAs, GaN, SiC is described. Oxides other than SrTiO3 that have been grown on Si(100) are also reviewed. It is hoped that this short history of the major advances in oxide/semiconductor epitaxy can provide insight into the various substrate preparation and film deposition tricks and techniques that enable such epitaxial systems to be made.

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Vorheriges Kapitel Integration of Functional Oxides on SrTiO3/Si Pseudo-Substrates
Nächstes Kapitel Outlook and Parting Thoughts
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Metadaten
Titel
Other Epitaxial Oxides on Semiconductors
verfasst von
Alexander A. Demkov
Agham B. Posadas
Copyright-Jahr
2014
Verlag
Springer New York
Buch
Integration of Functional Oxides with Semiconductors

Print ISBN: 978-1-4614-9319-8

Electronic ISBN: 978-1-4614-9320-4

Copyright-Jahr: 2014

DOI
https://doi.org/10.1007/978-1-4614-9320-4_8

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