2007 | OriginalPaper | Buchkapitel
Physics-Based Simulation of 1/f Noise in MOSFETs under Large-Signal Operation
verfasst von : Sung-Min Hong, Hong-Hyun Park, Chan Hyeong Park, Myoung Jin Lee, Hong Shick Min, Young June Park
Erschienen in: Simulation of Semiconductor Processes and Devices 2007
Verlag: Springer Vienna
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1/
f
noise in MOSFETs under large-signal excitation, which is important in CMOS analog and RF circuits, is modeled as a perturbation in the semiconductor equations employing the oxide-trapping model. The oxide-trapping model for a MOSFET in periodic large-signal operation shows that 1/
f
noise reduces more than the small-signal noise model predicts as the gate OFF voltage decreases further below the threshold voltage.