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Erschienen in:

2013 | OriginalPaper | Buchkapitel

6. Polymer-Assisted Deposition

verfasst von : Anthony K. Burrell, Thomas M. McCleskey, Quanxi Jia

Erschienen in: Chemical Solution Deposition of Functional Oxide Thin Films

Verlag: Springer Vienna

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Abstract

In this chapter, polymer-assisted deposition (PAD) to grow metal-oxide films with desired structural and physical properties is described. In the PAD process, the polymer controls the viscosity and binds metal-ions, resulting in a homogeneous distribution of metal precursors in the solution and the formation of uniform metal-organic films. The latter feature makes it possible to grow a wide range of simple and complex metal-oxide films with desired structural and physical properties. Compared to other chemical solution deposition techniques, the development of PAD technology is still in the early stage. Many issues related to materials science and chemistry need to be investigated, and further optimization of processes is necessary for the high quality materials.

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Vorheriges Kapitel Aqueous Precursor Systems

Nächstes Kapitel Thermal Analysis

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Titel: Polymer-Assisted Deposition
verfasst von: Anthony K. Burrell
Thomas M. McCleskey
Quanxi Jia
Verlag: Springer Vienna
Buch: Chemical Solution Deposition of Functional Oxide Thin Films
Print ISBN: 978-3-211-99310-1

Electronic ISBN: 978-3-211-99311-8

Copyright-Jahr: 2013
DOI: https://doi.org/10.1007/978-3-211-99311-8_6

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