Introduction
Experimental Methodology
Material and Processing Parameters
Focus offset | Hatch spacing, µm | Contour spacing, mm | Point distance, µm | Scanning strategy |
---|---|---|---|---|
0 | 80 | 0.2 | 65 | 90° alternate |
Density and Microstructure
Test case | S-1 | CED-1 | CED-2 | CED-3 | CED-4 |
---|---|---|---|---|---|
Power, W and exposure, µs | 200 and 100 | 180 and 111 | 170 and 118 | 160 and 125 | 150 and 133 |
Test case | LT-1 | LT-2 | LT-3 |
---|---|---|---|
Layer thickness, µm | 25 | 50 | 75 |
Power, W | 170 | 200 | 200 |
Exposure, µs | 80 | 100 | 120 |