Rapid fabrication of super-hydrophobic surfaces of silicon wafers with excellent anisotropic wetting

In recent years, the fabrication of hydrophobic and super-hydrophobic surfaces has been a hotspots in research field. In this study, we proposed a novel method by combining the laser ablation technology and chemical salinization process to obtain the hydrophobic and even the super-hydrophobic silicon surfaces. Three different types of patterns (linear patterns, square patterns and dot patterns) were fabricated on the silicon wafers and the surface morphology of various patterns were observed by optical microscope. Then the effects of LWD parameters and interval parameters on surface wettability were studied by measuring the values of the contact angles (always written in CA). Additionally, the relationships between the LWD parameters, interval parameters and the two-dimensional anisotropic properties after the salinization process were also studied in this paper. This method may play a significant role in academic and industrial applications regarding to the functional surfaces, microfluidic devices, micro-electronics and so on.