1 Introduction
2 Experimental procedure
2.1 Synthesis
2.2 Growth of BTMC
Bis (thiourea) manganese chloride | |
---|---|
Molecular formula | Mn[CS(NH)2]2Cl2 |
Solvent used | Double distilled water |
Molar ratio of thiourea and manganese chloride | 2:1 |
Technique | Slow cooling |
Growth temperature | 45 °C |
Size | 8 × 8 × 2 mm3 |
Period of growth | 2–3 weeks |
pH | 5 |
3 Results and discussion
3.1 Single crystal X-ray diffraction analyses
3.2 FT-IR spectral analyses
Wavenumber (cm−1) | Assignment | |
---|---|---|
Thiourea | BTMC | |
3380 | 3369 | NH2 asymmetric stretching |
3279 | 3270 | N–H symmetric stretching |
3090 | 2921 | C–H Stretching vibration |
1620 | 1604 | NH2 bending |
1477 | 1468 | N–C–N stretching |
1414 | 1405 | C=S stretching |
1082 | 1080 | NH2 rocking |
740 | 722 | C–N stretching |
– | 552 | C–Cl stretching |
494 | 521 | N–C–S deformation |
3.3 UV–Visible spectral analyses
S.No. | Name of the sample | UV cut-off wavelength (nm) |
---|---|---|
1 | Tetrakis(thiourea)zinc(II) picrate | 290 [24] |
2 | poly bis(thiourea) silver(I) nitrate | 329 [25] |
3 | Calcium bis-thiourea chloride | 290 [7] |
4 | bis thiourea cadmiumiodide | 324 [26] |
Bis(thiourea) zinc formate | 300 [27] | |
5 | Bis(thiourea) zinc chloride | 290 [28] |
6 | Bis(thiourea) manganese chloride (BTMC) | 280 * Present work |
3.4 Determination of optical parameters
3.5 Micro hardness test
3.5.1 Yield strength
3.5.2 Elastic stiffness constant
3.5.3 Fracture toughness
3.5.4 Brittleness index
Load P (g) | Hv (kg/mm2) | D (μm) | Yield strength (σy) (kg/mm2) | Elastic stiffness constant (C11) | Fracture toughness (Kc) ×104 kg/m3/2 | Brittleness index (Bi) m−1/2 |
---|---|---|---|---|---|---|
25 | 41.5 | 33.39 | 0.929 | 679.98 | 5.235 | 793.62 |
50 | 64.9 | 37.89 | 1.451 | 1483.98 | 8.659 | 749.45 |
100 | 86.2 | 46.69 | 1.927 | 2438.58 | 12.663 | 680.71 |
3.6 Dielectric studies
3.7 Photoconductivity studies
3.8 SEM analysis
3.9 EDAX analyses
Elements | Weight % | Atomic % |
---|---|---|
N K | 64.10 | 81.51 |
S K | 23.10 | 12.76 |
Cl K | 8.83 | 4.44 |
Mn K | 3.97 | 1.29 |
Total | 100.00 | 100.00 |
3.10 Etching study
3.11 Second harmonic generation (SHG) studies
3.12 Z-scan studies
Parameters | Values |
---|---|
Laser power | 100 mW |
Laser beam wavelength (λ) | 532 nm |
Lens focal length (f) | 103 mm |
Beam radius of the aperture (wa) | 1.4 mm |
Radius aperture (ra) | 1.25 mm |
Beam radius on the lens (wL) | 2.5 mm |
Sample thickness (L) | 1 mm |
Effective thickness (Leff) | 0.855 mm |
Nonlinear refractive index (n2) | 1.14 × 10−15m3/W |
Nonlinear absorption co-efficient (β) | 3.4460 × 10−9 m/W |
Real part of the third-order susceptibility [Re(χ(3))] | 5.1202 × 10−14 esu |
Imaginary part of the third-order susceptibility [Im (χ(3))] | 6.5771 × 10−13 esu |
Third-order nonlinear optical susceptibility (χ(3)) | 5.1202 × 10−14 esu |