Skip to main content
Erschienen in:

15.08.2023

Single-event effect hardening of the Schottky contact super barrier rectifier (SSBR) with high-k gate dielectric

verfasst von: Aohang Zhang, Wensuo Chen, Jiaweiwen Huang, Qisheng Yu, Yuying Wang, Jian Li

Erschienen in: Journal of Computational Electronics | Ausgabe 5/2023

Einloggen

Aktivieren Sie unsere intelligente Suche, um passende Fachinhalte oder Patente zu finden.

search-config
loading …

Abstract

In this paper, the single-event effects of Schottky contact super barrier rectifier (SSBR) and conventional super barrier rectifier (SBR) as comparison structure are simulated and discussed. The high-k dielectric has a larger dielectric constant and a larger physical thickness at the same equivalent oxide thickness (EOT). Therefore, it is used to enhance the single-event gate rupture (SEGR) performance of the devices. Simulation results show that the SEGR performance of SSBR and SBR is significantly improved after using high-k dielectric as the gate dielectric. Furthermore, due to the absence of a parasitic bipolar junction transistor (BJT), SSBR has a higher single-event burnout (SEB) performance than conventional SBR. In conclusion, SSBR has a good performance of single-event effect (SEGR and SEB) and is better than that of SBR after using high-k dielectric as the gate dielectric.

Sie haben noch keine Lizenz? Dann Informieren Sie sich jetzt über unsere Produkte:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Springer Professional "Wirtschaft"

Online-Abonnement

Mit Springer Professional "Wirtschaft" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 340 Zeitschriften

aus folgenden Fachgebieten:

  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Versicherung + Risiko




Jetzt Wissensvorsprung sichern!

Literatur
8.
11.
Zurück zum Zitat Allenspach, M., Mouret, I., Titus, J.L., Wheatley, C.F., Pease, R.L., Brews, J.R., Schrimpf, R.D., Galloway, K.F.: Single-event gate-rupture in power MOSFETs: prediction of breakdown biases and evaluation of oxide thickness dependence. IEEE Trans. Nucl. Sci. 42, 1922–1927 (1995). https://doi.org/10.1109/23.489234CrossRef Allenspach, M., Mouret, I., Titus, J.L., Wheatley, C.F., Pease, R.L., Brews, J.R., Schrimpf, R.D., Galloway, K.F.: Single-event gate-rupture in power MOSFETs: prediction of breakdown biases and evaluation of oxide thickness dependence. IEEE Trans. Nucl. Sci. 42, 1922–1927 (1995). https://​doi.​org/​10.​1109/​23.​489234CrossRef
13.
14.
Zurück zum Zitat Muthuseenu, K., Barnaby, H.J., Galloway, K.F., Koziukov, A.E., Maksimenko, T.A., Vyrostkov, M.Y., Bu-Khasan, K.B., Kalashnikova, A.A., Privat, A.: Single-event gate rupture hardened structure for high-voltage super-junction power MOSFETs. IEEE Trans. Electron Devices 68, 4004–4009 (2021). https://doi.org/10.1109/TED.2021.3091952CrossRef Muthuseenu, K., Barnaby, H.J., Galloway, K.F., Koziukov, A.E., Maksimenko, T.A., Vyrostkov, M.Y., Bu-Khasan, K.B., Kalashnikova, A.A., Privat, A.: Single-event gate rupture hardened structure for high-voltage super-junction power MOSFETs. IEEE Trans. Electron Devices 68, 4004–4009 (2021). https://​doi.​org/​10.​1109/​TED.​2021.​3091952CrossRef
24.
Zurück zum Zitat Verma, R., Ranjan, S., Naugarhiya, A.: Analysis of single event gate rupture in trench gate SJ-VDMOS with SiO2-Si3N4 dielectric stacking. In: 2021 IEEE region 10 symposium (TENSYMP). Presented at the 2021 IEEE Region 10 symposium (TENSYMP), IEEE, Jeju, Korea, Republic of, pp. 1–6 (2021). https://doi.org/10.1109/TENSYMP52854.2021.9550886 Verma, R., Ranjan, S., Naugarhiya, A.: Analysis of single event gate rupture in trench gate SJ-VDMOS with SiO2-Si3N4 dielectric stacking. In: 2021 IEEE region 10 symposium (TENSYMP). Presented at the 2021 IEEE Region 10 symposium (TENSYMP), IEEE, Jeju, Korea, Republic of, pp. 1–6 (2021). https://​doi.​org/​10.​1109/​TENSYMP52854.​2021.​9550886
25.
Zurück zum Zitat Amjath, M., Ranjan, S., Naugarhiya, A.: SEGR analysis of super junction VDMOS using HfO 2 as gate dielectric. In: 2022 Second international conference on advances in electrical, computing, communication and sustainable technologies (ICAECT). Presented at the 2022 second international conference on advances in electrical, computing, communication and sustainable technologies (ICAECT), IEEE, Bhilai, India, pp. 1–5 (2022). https://doi.org/10.1109/ICAECT54875.2022.9808021 Amjath, M., Ranjan, S., Naugarhiya, A.: SEGR analysis of super junction VDMOS using HfO 2 as gate dielectric. In: 2022 Second international conference on advances in electrical, computing, communication and sustainable technologies (ICAECT). Presented at the 2022 second international conference on advances in electrical, computing, communication and sustainable technologies (ICAECT), IEEE, Bhilai, India, pp. 1–5 (2022). https://​doi.​org/​10.​1109/​ICAECT54875.​2022.​9808021
26.
Zurück zum Zitat Byoung Hun Lee, Laegu Kang, Wen-Jie Qi, Renee Nieh, Yongjoo Jeon, Katsunori Onishi, Lee, J.C.: Ultrathin hafnium oxide with low leakage and excellent reliability for alternative gate dielectric application. In: International electron devices meeting 1999. Technical Digest (Cat. No.99CH36318). Presented at the international electron devices meeting 1999. Technical Digest, IEEE, Washington, DC, USA, pp. 133–136 (1999). https://doi.org/10.1109/IEDM.1999.823863 Byoung Hun Lee, Laegu Kang, Wen-Jie Qi, Renee Nieh, Yongjoo Jeon, Katsunori Onishi, Lee, J.C.: Ultrathin hafnium oxide with low leakage and excellent reliability for alternative gate dielectric application. In: International electron devices meeting 1999. Technical Digest (Cat. No.99CH36318). Presented at the international electron devices meeting 1999. Technical Digest, IEEE, Washington, DC, USA, pp. 133–136 (1999). https://​doi.​org/​10.​1109/​IEDM.​1999.​823863
Metadaten
Titel
Single-event effect hardening of the Schottky contact super barrier rectifier (SSBR) with high-k gate dielectric
verfasst von
Aohang Zhang
Wensuo Chen
Jiaweiwen Huang
Qisheng Yu
Yuying Wang
Jian Li
Publikationsdatum
15.08.2023
Verlag
Springer US
Erschienen in
Journal of Computational Electronics / Ausgabe 5/2023
Print ISSN: 1569-8025
Elektronische ISSN: 1572-8137
DOI
https://doi.org/10.1007/s10825-023-02088-8