Sputtering of Metals with 20 keV O2 +; Characteristic Etch Patterns, Sputtered Atom Yields and Secondary Ion Mass Spectra

In secondary ion mass spectrometry an oxygen primary beam is frequently used because it enhances and stabilizes the yield of secondary sample ions [1,2]. But its role in the process of secondary ion emission is not yet fully understood [3–6].The purpose of the present paper is to investigate the surface structure, sputtered atom yields and secondary ion mass spectra of metals bombarded with O₂+. Accumulation of these fundamental data will help to elucidate the effect of oxygen ion on sputtering and to establish the method of quantitative interpretation of mass spectra.