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2022 | OriginalPaper | Buchkapitel

5. Sputtering

verfasst von : Bernd Rauschenbach

Erschienen in: Low-Energy Ion Irradiation of Materials

Verlag: Springer International Publishing

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Abstract

Sputtering techniques are of great importance for both academic research and commercial applications. This chapter summarizes the fundamentals of the sputtering process, especially after low-energy ion bombardment. The theoretical description of the total sputtering yield, and the energy and angular distribution of the sputtered atoms is based on the assumption of a linear cascade regime. The description of the sputtering process in the linear regime according to Sigmund for amorphous materials by means of the Boltzmann transport equation is briefly presented, the energy dependence of the sputtering yield is demonstrated, and the influence of critical parameters, such as surface binding energy, threshold energy and material correction factor is discussed. The dependence of the sputtering yield on the ion incidence angle and also the energy and angular distributions of the sputtered particles are considered in detail. The particular case of preferential sputtering in low-energy ion bombardment of binary materials is addressed, considering both the mass effect and the bonding effect. An important aspect of this chapter is the measurement of the sputtering yield and energy and angular distributions of the sputtered particles. Finally, the reflection of low-energy ions from surfaces is briefly presented.

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Metadaten
Titel
Sputtering
verfasst von
Bernd Rauschenbach
Copyright-Jahr
2022
DOI
https://doi.org/10.1007/978-3-030-97277-6_5

    Marktübersichten

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