Skip to main content
Erschienen in: Journal of Computational Electronics 4/2017

29.08.2017 | S.I.: Computational Electronics of Emerging Memory Elements

Stochastic circuit breaker network model for bipolar resistance switching memories

verfasst von: S. Brivio, S. Spiga

Erschienen in: Journal of Computational Electronics | Ausgabe 4/2017

Einloggen

Aktivieren Sie unsere intelligente Suche, um passende Fachinhalte oder Patente zu finden.

search-config
loading …

Abstract

We present a stochastic model for resistance switching devices in which a square grid of resistor breakers plays the role of the insulator switching layer. The probability of breaker switching between two fixed resistance values, \(R_\mathrm{OFF}\) and \(R_\mathrm{ON}\), is determined by the corresponding voltage drop and thermal Joule heating. The breaker switching produces the overall device resistance change. Salient features of all the switching operations of bipolar resistance switching memories (RRAMs) are reproduced by the model and compared to a prototypical \(\hbox {HfO}_2\)-based RRAM device. In particular, the need of a forming process that leads a fresh highly insulating device to a low resistance state (LRS) is captured by the model. Moreover, the model is able to reproduce the RESET process, which partially restores the insulating state through a gradual resistance transition as a function of the applied voltage and the abrupt nature of the SET process that restores the LRS. Furthermore, the multilevel capacity of a typical RRAM device obtained by tuning RESET voltage and SET compliance current is reproduced. The manuscript analyses the peculiar ingredients of the model and their influence on the simulated current–voltage curves and, in addition, provides a detailed description of the mechanisms that connect the switching of the single breakers and that of the overall device.

Sie haben noch keine Lizenz? Dann Informieren Sie sich jetzt über unsere Produkte:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Springer Professional "Wirtschaft"

Online-Abonnement

Mit Springer Professional "Wirtschaft" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 340 Zeitschriften

aus folgenden Fachgebieten:

  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Versicherung + Risiko




Jetzt Wissensvorsprung sichern!

Fußnoten
1
the fraction of breaker is evaluated with respect of the total amount of breakers in the grid, i.e., \((m-1)\cdot n\) vertical and \(m\cdot (n-1)\) horizontal breakers.
 
Literatur
1.
3.
Zurück zum Zitat Chen, H.Y., Brivio, S., Chang, C.C., Frascaroli, J., Hou, T.H., Hudec, B., Liu, M., Lv, H., Molas, G., Sohn, J., Spiga, S., Teja, V.M., Vianello, E., Wong, H.S.P.: Resistive random access memory (RRAM) technology: from material, device, selector, 3D integration to bottom-up fabrication. J. Electroceramics (2017). doi:10.1007/s10832-017-0095-9 Chen, H.Y., Brivio, S., Chang, C.C., Frascaroli, J., Hou, T.H., Hudec, B., Liu, M., Lv, H., Molas, G., Sohn, J., Spiga, S., Teja, V.M., Vianello, E., Wong, H.S.P.: Resistive random access memory (RRAM) technology: from material, device, selector, 3D integration to bottom-up fabrication. J. Electroceramics (2017). doi:10.​1007/​s10832-017-0095-9
6.
Zurück zum Zitat Covi, E., Brivio, S., Serb, A., Prodromakis, T., Fanciulli, M., Spiga, S.: Analog memristive synapse in spiking networks implementing unsupervised learning. Front. Neurosci. 10, 482 (2016). doi:10.3389/fnins.2016.00482 CrossRef Covi, E., Brivio, S., Serb, A., Prodromakis, T., Fanciulli, M., Spiga, S.: Analog memristive synapse in spiking networks implementing unsupervised learning. Front. Neurosci. 10, 482 (2016). doi:10.​3389/​fnins.​2016.​00482 CrossRef
7.
Zurück zum Zitat Prezioso, M., Merrikh-Bayat, F., Hoskins, B.D., Adam, G., Likharev, K.K., Strukov, D.: Training and operation of an integrated neuromorphic network based on metal-oxide memristors. Nat. Lett. 521, 61 (2015). doi:10.1038/nature14441 CrossRef Prezioso, M., Merrikh-Bayat, F., Hoskins, B.D., Adam, G., Likharev, K.K., Strukov, D.: Training and operation of an integrated neuromorphic network based on metal-oxide memristors. Nat. Lett. 521, 61 (2015). doi:10.​1038/​nature14441 CrossRef
8.
Zurück zum Zitat Garbin, D., Vianello, E., Bichler, O., Rafhay, Q., Gamrat, C., Ghibaudo, G., DeSalvo, B., Perniola, L.: HfO\(_{\text{2 }}\)-based OxRAM devices as synapses for convolutional neural networks. IEEE Trans. Electron Devices 62(8), 2494 (2015). doi:10.1109/TED.2015.2440102 CrossRef Garbin, D., Vianello, E., Bichler, O., Rafhay, Q., Gamrat, C., Ghibaudo, G., DeSalvo, B., Perniola, L.: HfO\(_{\text{2 }}\)-based OxRAM devices as synapses for convolutional neural networks. IEEE Trans. Electron Devices 62(8), 2494 (2015). doi:10.​1109/​TED.​2015.​2440102 CrossRef
9.
Zurück zum Zitat Borghetti, J., Snider, G.S., Kuekes, P.J., Yang, J.J., Steward, D.R., Williams, R.S.: Memristive switches enable stateful logic operations via material implication. Nature 464, 873 (2010). doi:10.1038/nature08940 CrossRef Borghetti, J., Snider, G.S., Kuekes, P.J., Yang, J.J., Steward, D.R., Williams, R.S.: Memristive switches enable stateful logic operations via material implication. Nature 464, 873 (2010). doi:10.​1038/​nature08940 CrossRef
10.
12.
Zurück zum Zitat Huang, P., Liu, X.Y., Chen, B., Li, H.T., Wang, Y.J., Deng, Y.X., Wei, K.L., Zeng, L., Gao, B., Du, G., Zhang, X., Kang, J.F.: A physics-based compact model of metal-oxide-based RRAM DC and AC operations. IEEE Trans. Electron Devices 60(12), 4090 (2013). doi:10.1109/TED.2013.2287755 CrossRef Huang, P., Liu, X.Y., Chen, B., Li, H.T., Wang, Y.J., Deng, Y.X., Wei, K.L., Zeng, L., Gao, B., Du, G., Zhang, X., Kang, J.F.: A physics-based compact model of metal-oxide-based RRAM DC and AC operations. IEEE Trans. Electron Devices 60(12), 4090 (2013). doi:10.​1109/​TED.​2013.​2287755 CrossRef
13.
Zurück zum Zitat Piccolboni, G, Molas, G., Portal, J.M., Coquand, R., Bocquet, M., Garbin, D., Vianello, E., Carabasse, C., Delaye, V., Pellissier, C., Magis, T., Cagli, C., Gely, M., Cueto, O., Deleruyelle, D., Ghibaudo, G., Salvo, B.D., Perniola, L.: Investigation of the potentialities of Vertical Resistive RAM (VRRAM) for neuromorphic applications. In: IEEE International Electron Devices Meeting (IEDM), pp. 17.2.1–17.2.4. (2015). doi:10.1109/IEDM.2015.7409717 Piccolboni, G, Molas, G., Portal, J.M., Coquand, R., Bocquet, M., Garbin, D., Vianello, E., Carabasse, C., Delaye, V., Pellissier, C., Magis, T., Cagli, C., Gely, M., Cueto, O., Deleruyelle, D., Ghibaudo, G., Salvo, B.D., Perniola, L.: Investigation of the potentialities of Vertical Resistive RAM (VRRAM) for neuromorphic applications. In: IEEE International Electron Devices Meeting (IEDM), pp. 17.2.1–17.2.4. (2015). doi:10.​1109/​IEDM.​2015.​7409717
14.
Zurück zum Zitat Degraeve, R., Fantini, A., Raghavan, N., Goux, L., Clima, S., Govoreanu, B., Belmonte, A., Linten, D., Jurczak, M.: Causes and consequences of the stochastic aspect of filamentary RRAM. Microelectron. Eng. 147, 171 (2015). doi:10.1016/j.mee.2015.04.025 CrossRef Degraeve, R., Fantini, A., Raghavan, N., Goux, L., Clima, S., Govoreanu, B., Belmonte, A., Linten, D., Jurczak, M.: Causes and consequences of the stochastic aspect of filamentary RRAM. Microelectron. Eng. 147, 171 (2015). doi:10.​1016/​j.​mee.​2015.​04.​025 CrossRef
15.
Zurück zum Zitat Balatti, S., Ambrogio, S., Carboni, R., Milo, V., Wang, Z., Calderoni, A., Ramaswamy, N., Ielmini, D.: Physical unbiased generation of random numbers with coupled resistive switching devices. IEEE Trans. Electron Devices 63(5), 2029 (2016). doi:10.1109/TED.2016.2537792 CrossRef Balatti, S., Ambrogio, S., Carboni, R., Milo, V., Wang, Z., Calderoni, A., Ramaswamy, N., Ielmini, D.: Physical unbiased generation of random numbers with coupled resistive switching devices. IEEE Trans. Electron Devices 63(5), 2029 (2016). doi:10.​1109/​TED.​2016.​2537792 CrossRef
16.
Zurück zum Zitat Bill, J., Legenstein, R.: A compound memristive synapse model for statistical learning through STDP in spiking neural networks. Front. Neurosci. 8, 412 (2014). doi:10.3389/fnins.2014.00412 Bill, J., Legenstein, R.: A compound memristive synapse model for statistical learning through STDP in spiking neural networks. Front. Neurosci. 8, 412 (2014). doi:10.​3389/​fnins.​2014.​00412
18.
Zurück zum Zitat Padovani, A., Larcher, L., Pirrotta, O., Vandelli, L., Bersuker, G.: Microscopic modeling of HfO\(_x\) RRAM operations: from forming to switching. IEEE Trans. Electron Devices 62(6), 1998 (2015). doi:10.1109/TED.2015.2418114 CrossRef Padovani, A., Larcher, L., Pirrotta, O., Vandelli, L., Bersuker, G.: Microscopic modeling of HfO\(_x\) RRAM operations: from forming to switching. IEEE Trans. Electron Devices 62(6), 1998 (2015). doi:10.​1109/​TED.​2015.​2418114 CrossRef
19.
Zurück zum Zitat Abbaspour, E., Menzel, S., Jungemann, C.: The role of the interface reactions in the electroforming of redox-based resistive switching devices using KMC simulations. In: 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (2015), pp. 293–296. doi:10.1109/SISPAD.2015.7292317 Abbaspour, E., Menzel, S., Jungemann, C.: The role of the interface reactions in the electroforming of redox-based resistive switching devices using KMC simulations. In: 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (2015), pp. 293–296. doi:10.​1109/​SISPAD.​2015.​7292317
20.
Zurück zum Zitat Brivio, S., Frascaroli, J., Spiga, S.: Role of metal-oxide interfaces in the multiple resistance switching regimes of Pt/HfO\(_2\)/TiN devices. Appl. Phys. Lett. 107(2), 023504 (2015). doi:10.1063/1.4926340 CrossRef Brivio, S., Frascaroli, J., Spiga, S.: Role of metal-oxide interfaces in the multiple resistance switching regimes of Pt/HfO\(_2\)/TiN devices. Appl. Phys. Lett. 107(2), 023504 (2015). doi:10.​1063/​1.​4926340 CrossRef
21.
Zurück zum Zitat Frascaroli, J., Brivio, S., Ferrarese Lupi, F., Seguini, G., Boarino, L., Perego, M., Spiga, S.: Resistive switching in high-density nanodevices fabricated by block copolymer self-assembly. ACS Nano 9(3), 2518 (2015). doi:10.1021/nn505131b CrossRef Frascaroli, J., Brivio, S., Ferrarese Lupi, F., Seguini, G., Boarino, L., Perego, M., Spiga, S.: Resistive switching in high-density nanodevices fabricated by block copolymer self-assembly. ACS Nano 9(3), 2518 (2015). doi:10.​1021/​nn505131b CrossRef
22.
Zurück zum Zitat Bersuker, G., Gilmer, D., Veksler, D., Kirsch, P., Vandelli, L., Padovani, A., Larcher, L., McKenna, K., Schluger, A., Iglesias, V., Porti, M., Nafría, M.: Metal oxide resistive memory switching mechanism based on conductive filament properties. J. Appl. Phys. 110(12), 124518 (2011). doi:10.1063/1.3671565 CrossRef Bersuker, G., Gilmer, D., Veksler, D., Kirsch, P., Vandelli, L., Padovani, A., Larcher, L., McKenna, K., Schluger, A., Iglesias, V., Porti, M., Nafría, M.: Metal oxide resistive memory switching mechanism based on conductive filament properties. J. Appl. Phys. 110(12), 124518 (2011). doi:10.​1063/​1.​3671565 CrossRef
24.
25.
Zurück zum Zitat Brivio, S., Tallarida, G., Perego, D., Franz, S., Deleruyelle, D., Muller, C., Spiga, S.: Low-power resistive switching in Au/NiO/Au nanowire arrays. Appl. Phys. Lett. 101, 223510 (2012). doi:10.1063/1.4769044 CrossRef Brivio, S., Tallarida, G., Perego, D., Franz, S., Deleruyelle, D., Muller, C., Spiga, S.: Low-power resistive switching in Au/NiO/Au nanowire arrays. Appl. Phys. Lett. 101, 223510 (2012). doi:10.​1063/​1.​4769044 CrossRef
26.
27.
Zurück zum Zitat Brivio, S., Covi, E., Serb, A., Prodromakis, T., Fanciulli, M.: S. SpigaExperimental study of gradual/abrupt dynamics of HfO2-based memristive devices. Appl. Phys. Lett. 109(13), 133504 (2016). doi:10.1063/1.4963675 CrossRef Brivio, S., Covi, E., Serb, A., Prodromakis, T., Fanciulli, M.: S. SpigaExperimental study of gradual/abrupt dynamics of HfO2-based memristive devices. Appl. Phys. Lett. 109(13), 133504 (2016). doi:10.​1063/​1.​4963675 CrossRef
28.
Zurück zum Zitat Chae, S.C., Lee, J.S., Kim, S., Lee, S.B., Chang, S.H., Liu, C., Kahng, B., Shin, H., Kim, D.W., Jung, C.U., Seo, S., Lee, M.J., Noh, T.W.: Random circuit breaker network model for unipolar resistance switching. Adv. Mater. 20(6), 1154 (2008). doi:10.1002/adma.200702024 CrossRef Chae, S.C., Lee, J.S., Kim, S., Lee, S.B., Chang, S.H., Liu, C., Kahng, B., Shin, H., Kim, D.W., Jung, C.U., Seo, S., Lee, M.J., Noh, T.W.: Random circuit breaker network model for unipolar resistance switching. Adv. Mater. 20(6), 1154 (2008). doi:10.​1002/​adma.​200702024 CrossRef
29.
Zurück zum Zitat Chang, S.H., Lee, J.S., Chae, S.C., Lee, S.B., Liu, C., Kahng, B., Kim, D.W., Noh, T.W.: Occurrence of both unipolar memory and threshold resistance switching in a NiO film. Phys. Rev. Lett. 102, 026801 (2009). doi:10.1103/PhysRevLett.102.026801 CrossRef Chang, S.H., Lee, J.S., Chae, S.C., Lee, S.B., Liu, C., Kahng, B., Kim, D.W., Noh, T.W.: Occurrence of both unipolar memory and threshold resistance switching in a NiO film. Phys. Rev. Lett. 102, 026801 (2009). doi:10.​1103/​PhysRevLett.​102.​026801 CrossRef
30.
Zurück zum Zitat Liu, C., Chae, S.C., Lee, J.S., Chang, S.H., Lee, S.B., Kim, D.W., Jung, C.U., Seo, S., Ahn, S.E., Kahng, B., Noh, T.W.: Abnormal resistance switching behaviours of NiO thin films: possible occurrence of both formation and rupturing of conducting channels. J. Phys. D Appl. Phys. 42(1), 015506 (2009). doi:10.1088/0022-3727/42/1/015506 CrossRef Liu, C., Chae, S.C., Lee, J.S., Chang, S.H., Lee, S.B., Kim, D.W., Jung, C.U., Seo, S., Ahn, S.E., Kahng, B., Noh, T.W.: Abnormal resistance switching behaviours of NiO thin films: possible occurrence of both formation and rupturing of conducting channels. J. Phys. D Appl. Phys. 42(1), 015506 (2009). doi:10.​1088/​0022-3727/​42/​1/​015506 CrossRef
32.
Zurück zum Zitat Xing, J., Li, Q., Tian, X., Li, Z., Xu, H.: A memristor random circuit breaker model accounting for stimulus thermal accumulation. IEICE Electron. Express advpub (2016). doi:10.1587/elex.13.20160376 Xing, J., Li, Q., Tian, X., Li, Z., Xu, H.: A memristor random circuit breaker model accounting for stimulus thermal accumulation. IEICE Electron. Express advpub (2016). doi:10.​1587/​elex.​13.​20160376
33.
Zurück zum Zitat Lee, S.B., Lee, J.S., Chang, S.H., Yoo, H.K., Kang, B.S., Kahng, B., Lee, M.J., Kim, C.J., Noh, T.W.: Interface-modified random circuit breaker network model applicable to both bipolar and unipolar resistance switching. Appl. Phys. Lett. 98(3), 033502 (2011). doi:10.1063/1.3543776 CrossRef Lee, S.B., Lee, J.S., Chang, S.H., Yoo, H.K., Kang, B.S., Kahng, B., Lee, M.J., Kim, C.J., Noh, T.W.: Interface-modified random circuit breaker network model applicable to both bipolar and unipolar resistance switching. Appl. Phys. Lett. 98(3), 033502 (2011). doi:10.​1063/​1.​3543776 CrossRef
34.
Zurück zum Zitat Li, C., Gao, B., Yao, Y., Guan, X., Shen, X., Wang, Y., Huang, P., Liu, L., Liu, X., Li, J., Gu, C., Kang, J., Yu, R.: Direct observations of nanofilament evolution in switching processes in HfO2-based resistive random access memory by in situ TEM studies. Adv. Mater. (2017). doi:10.1002/adma.201602976.1602976 Li, C., Gao, B., Yao, Y., Guan, X., Shen, X., Wang, Y., Huang, P., Liu, L., Liu, X., Li, J., Gu, C., Kang, J., Yu, R.: Direct observations of nanofilament evolution in switching processes in HfO2-based resistive random access memory by in situ TEM studies. Adv. Mater. (2017). doi:10.​1002/​adma.​201602976.​1602976
35.
Zurück zum Zitat Yu, S., Guan, X., Wong, H.S.P.: On the stochastic nature of resistive switching in metal oxide RRAM: Physical modeling, monte carlo simulation, and experimental characterization. In: Electron Devices Meeting (IEDM), IEEE International, 2011, pp. 17.3.1–17.3.4 (2011). doi:10.1109/IEDM.2011.6131572 Yu, S., Guan, X., Wong, H.S.P.: On the stochastic nature of resistive switching in metal oxide RRAM: Physical modeling, monte carlo simulation, and experimental characterization. In: Electron Devices Meeting (IEDM), IEEE International, 2011, pp. 17.3.1–17.3.4 (2011). doi:10.​1109/​IEDM.​2011.​6131572
36.
Zurück zum Zitat Yu, S., Chen, Y.Y., Guan, X., Wong, H.S.P., Kittl, J.A.: A Monte Carlo study of the low resistance state retention of HfOx based resistive switching memory. Appl. Phys. Lett. 100(4), 043507 (2012). doi:10.1063/1.3679610 CrossRef Yu, S., Chen, Y.Y., Guan, X., Wong, H.S.P., Kittl, J.A.: A Monte Carlo study of the low resistance state retention of HfOx based resistive switching memory. Appl. Phys. Lett. 100(4), 043507 (2012). doi:10.​1063/​1.​3679610 CrossRef
37.
Zurück zum Zitat Brivio, S., Covi, E., Serb, A., Prodromakis, T., Fanciulli, M., Spiga, S.: Gradual set dynamics in \(\text{HfO }_2\)-based memristor driven by sub-threshold voltage pulses. In Proceedings of IEEE International Conference on Memristive Systems (MEMRISYS), pp. 1–2 (2015). doi:10.1109/MEMRISYS.2015.7378383 Brivio, S., Covi, E., Serb, A., Prodromakis, T., Fanciulli, M., Spiga, S.: Gradual set dynamics in \(\text{HfO }_2\)-based memristor driven by sub-threshold voltage pulses. In Proceedings of IEEE International Conference on Memristive Systems (MEMRISYS), pp. 1–2 (2015). doi:10.​1109/​MEMRISYS.​2015.​7378383
38.
Zurück zum Zitat Brivio, S., Frascaroli, J., Spiga, S.: Role of Al doping in the filament disruption in \(\text{ HfO }_2\) resistance switches. Nanotechnology (2017). doi:10.1088/1361-6528/aa8013 Brivio, S., Frascaroli, J., Spiga, S.: Role of Al doping in the filament disruption in \(\text{ HfO }_2\) resistance switches. Nanotechnology (2017). doi:10.​1088/​1361-6528/​aa8013
40.
Zurück zum Zitat Spiga, S., Lamperti, A., Wiemer, C., Perego, M., Cianci, E., Tallarida, G., Lu, H., Alia, M., Volpe, F., Fanciulli, M.: Resistance switching in amorphous and crystalline binary oxides grown by electron beam evaporation and atomic layer deposition. Microelectron. Eng. 85(12), 2414 (2008). doi:10.1016/j.mee.2008.09.018 CrossRef Spiga, S., Lamperti, A., Wiemer, C., Perego, M., Cianci, E., Tallarida, G., Lu, H., Alia, M., Volpe, F., Fanciulli, M.: Resistance switching in amorphous and crystalline binary oxides grown by electron beam evaporation and atomic layer deposition. Microelectron. Eng. 85(12), 2414 (2008). doi:10.​1016/​j.​mee.​2008.​09.​018 CrossRef
41.
Zurück zum Zitat Spiga, S., Lamperti, A., Cianci, E., Volpe, F.G., Fanciulli, M.: Transition metal binary oxides for ReRAM applications. ECS Trans. 25(6), 411 (2009). doi:10.1149/1.3206640 CrossRef Spiga, S., Lamperti, A., Cianci, E., Volpe, F.G., Fanciulli, M.: Transition metal binary oxides for ReRAM applications. ECS Trans. 25(6), 411 (2009). doi:10.​1149/​1.​3206640 CrossRef
43.
Zurück zum Zitat Ferragut, R., Dupasquier, A., Brivio, S., Bertacco, R., Egger, W.: Study of defects in an electroresistive Au/La\(_{2/3}\)Sr\(_{1/3}\)MnO\(_3\)/SrTiO\(_3\)(001) heterostructure by positron annihilation. J. Appl. Phys. 110, 053511 (2011). doi:10.1063/1.3631825 CrossRef Ferragut, R., Dupasquier, A., Brivio, S., Bertacco, R., Egger, W.: Study of defects in an electroresistive Au/La\(_{2/3}\)Sr\(_{1/3}\)MnO\(_3\)/SrTiO\(_3\)(001) heterostructure by positron annihilation. J. Appl. Phys. 110, 053511 (2011). doi:10.​1063/​1.​3631825 CrossRef
44.
Zurück zum Zitat Traoré, B., Baise, P., Vianello, E., Grampiex, H., Bonnevialle, A., Jalaguier, E., Molas, G., Jeannot, S., Perniola, L., De Salvo, B., Nishi, Y.: Microscopic understanding of the low resistance state retention in HfO\(_2\) and HfAlO based RRAM. In: Proceedings of IEEE International Electron Devices Meeting (IEDM), p. 21.5.1 (2013). doi:10.1109/IEDM.2014.7047097 Traoré, B., Baise, P., Vianello, E., Grampiex, H., Bonnevialle, A., Jalaguier, E., Molas, G., Jeannot, S., Perniola, L., De Salvo, B., Nishi, Y.: Microscopic understanding of the low resistance state retention in HfO\(_2\) and HfAlO based RRAM. In: Proceedings of IEEE International Electron Devices Meeting (IEDM), p. 21.5.1 (2013). doi:10.​1109/​IEDM.​2014.​7047097
45.
Zurück zum Zitat Zhao, L., Ryu, SW., Hazeghi, A., Duncan, D., Magyari-Köpe, B., Nishi, Y.: Dopant selection rules for extrinsic tunability of HfOx RRAM characteristics: a systematic study. In: 2013 Symposium on VLSI Technology (VLSIT), p. T106 (2013) Zhao, L., Ryu, SW., Hazeghi, A., Duncan, D., Magyari-Köpe, B., Nishi, Y.: Dopant selection rules for extrinsic tunability of HfOx RRAM characteristics: a systematic study. In: 2013 Symposium on VLSI Technology (VLSIT), p. T106 (2013)
46.
Zurück zum Zitat Zhang, H., Gao, B., Sun, B., Chen, G., Zeng, L., Liu, L., Liu, X., Lu, J., Han, R., Kang, J., Yu, B.: Ionic doping effect in ZrO\(_2\) resistive switching memory. Appl. Phys. Lett. 96(12), 123502 (2010). doi:10.1063/1.3364130 CrossRef Zhang, H., Gao, B., Sun, B., Chen, G., Zeng, L., Liu, L., Liu, X., Lu, J., Han, R., Kang, J., Yu, B.: Ionic doping effect in ZrO\(_2\) resistive switching memory. Appl. Phys. Lett. 96(12), 123502 (2010). doi:10.​1063/​1.​3364130 CrossRef
47.
Zurück zum Zitat Wu, Y., Yu, S., Wong, H.S., Chen, Y.S., Lee , H.Y., Wang, S.M., . Gu, P.Y., Chen, F., Tsai, M.J.: Circuit implementation of spike time dependent plasticity (STDP) for artificial synapse. In: Proceedings of IEEE International Memory Workshop (IMW), pp. 1–4 (2012). doi:10.1109/IMW.2012.6213663 Wu, Y., Yu, S., Wong, H.S., Chen, Y.S., Lee , H.Y., Wang, S.M., . Gu, P.Y., Chen, F., Tsai, M.J.: Circuit implementation of spike time dependent plasticity (STDP) for artificial synapse. In: Proceedings of IEEE International Memory Workshop (IMW), pp. 1–4 (2012). doi:10.​1109/​IMW.​2012.​6213663
48.
Zurück zum Zitat Park, J., Woo, J., Prakash, A., Lee, S., Lim, S., Hwang, H.: Improved reset breakdown strength in a HfOx-based resistive memory by introducing RuOx oxygen diffusion barrier. AIP Adv. 26(5), 055114 (2016). doi:10.1063/1.4950966 CrossRef Park, J., Woo, J., Prakash, A., Lee, S., Lim, S., Hwang, H.: Improved reset breakdown strength in a HfOx-based resistive memory by introducing RuOx oxygen diffusion barrier. AIP Adv. 26(5), 055114 (2016). doi:10.​1063/​1.​4950966 CrossRef
49.
Zurück zum Zitat Russo, U., Ielmini, D., Cagli, C., Lacaita, A.: Self-accelerated thermal dissolution model for reset programming in unipolar resistive-switching memory (RRAM) devices. IEEE Trans. Electron Devices 56(2), 193 (2009). doi:10.1109/TED.2008.2010584 CrossRef Russo, U., Ielmini, D., Cagli, C., Lacaita, A.: Self-accelerated thermal dissolution model for reset programming in unipolar resistive-switching memory (RRAM) devices. IEEE Trans. Electron Devices 56(2), 193 (2009). doi:10.​1109/​TED.​2008.​2010584 CrossRef
50.
Zurück zum Zitat Celano, U., Goux, L., Belmonte, A., Giammaria, G., Opsomer, K., Detavernier, C., Richard, O., Bender, H., Irrera, F., Jurczak, M., Vandervorst, W.: Progressive versus abrupt reset behavior in conductive bridging devices: A C-AFM tomography study. In: IEEE International Electron Devices Meeting, pp. 14.1.1–14.1.4 (2014). doi:10.1109/IEDM.2014.7047048 Celano, U., Goux, L., Belmonte, A., Giammaria, G., Opsomer, K., Detavernier, C., Richard, O., Bender, H., Irrera, F., Jurczak, M., Vandervorst, W.: Progressive versus abrupt reset behavior in conductive bridging devices: A C-AFM tomography study. In: IEEE International Electron Devices Meeting, pp. 14.1.1–14.1.4 (2014). doi:10.​1109/​IEDM.​2014.​7047048
51.
Zurück zum Zitat Jana, D., Roy, S., Panja, R., Dutta, M., Rahaman, S.Z., Mahapatra, R., Maikap, S.: Conductive-bridging random access memory: challenges and opportunity for 3D architecture. Nanoscale Res. Lett. 10, 1 (2015). doi:10.1186/s11671-015-0880-9 CrossRef Jana, D., Roy, S., Panja, R., Dutta, M., Rahaman, S.Z., Mahapatra, R., Maikap, S.: Conductive-bridging random access memory: challenges and opportunity for 3D architecture. Nanoscale Res. Lett. 10, 1 (2015). doi:10.​1186/​s11671-015-0880-9 CrossRef
52.
Zurück zum Zitat Traoré, B., Blaise, P., Vianello, E., Perniola, L., Salvo, B.D., Nishi, Y.: HfO2-Based RRAM: Electrode Effects, Ti/HfO2 Interface, Charge Injection, and Oxygen (O) Defects Diffusion Through Experiment and Ab Initio Calculations. IEEE Trans. Electron Devices 63(1), 360 (2016). doi:10.1109/TED.2015.2503145 CrossRef Traoré, B., Blaise, P., Vianello, E., Perniola, L., Salvo, B.D., Nishi, Y.: HfO2-Based RRAM: Electrode Effects, Ti/HfO2 Interface, Charge Injection, and Oxygen (O) Defects Diffusion Through Experiment and Ab Initio Calculations. IEEE Trans. Electron Devices 63(1), 360 (2016). doi:10.​1109/​TED.​2015.​2503145 CrossRef
53.
Zurück zum Zitat Ambrogio, S., Balatti, S., Gilmes, D., Ielmini, D.: Analytical modeling of oxide-based bipolar resistive memories and complementary resistive switches. IEEE Trans. Electron Devices 61(7), 2378 (2014). doi:10.1109/TED.2014.2325531 CrossRef Ambrogio, S., Balatti, S., Gilmes, D., Ielmini, D.: Analytical modeling of oxide-based bipolar resistive memories and complementary resistive switches. IEEE Trans. Electron Devices 61(7), 2378 (2014). doi:10.​1109/​TED.​2014.​2325531 CrossRef
54.
Zurück zum Zitat Marchewka, A., Roesgen, B., Skaja, K., Du, H., Jia, C.L., Mayer, J., Rana, V., Waser, R., Menzel, S.: Nanoionic resistive switching memories: on the physical nature of the dynamic reset process. Adv. Electron. Mater. 2(1), 1500233 (2016). doi:10.1002/aelm.201500233.1500233 Marchewka, A., Roesgen, B., Skaja, K., Du, H., Jia, C.L., Mayer, J., Rana, V., Waser, R., Menzel, S.: Nanoionic resistive switching memories: on the physical nature of the dynamic reset process. Adv. Electron. Mater. 2(1), 1500233 (2016). doi:10.​1002/​aelm.​201500233.​1500233
55.
Zurück zum Zitat Kim, S., Du, C., Sheridan, P., Ma, W., Choi, S., Lu, W.D.: Experimental demonstration of a second-order memristor and its ability to biorealistically implement synaptic plasticity. Nano Lett. 15(3), 2203 (2015). doi:10.1021/acs.nanolett.5b00697 CrossRef Kim, S., Du, C., Sheridan, P., Ma, W., Choi, S., Lu, W.D.: Experimental demonstration of a second-order memristor and its ability to biorealistically implement synaptic plasticity. Nano Lett. 15(3), 2203 (2015). doi:10.​1021/​acs.​nanolett.​5b00697 CrossRef
56.
Zurück zum Zitat Vandelli, L., Padovani, A., Larcher, L., Broglia, G., Ori, G., Montorsi, M., Bersuker, G., Pavan, P.: Comprehensive physical modeling of forming and switching operations in HfO\(_{\text{2 }}\) RRAM devices. In: Proceedings of IEEE International Electron Devices Meeting (IEDM), pp. 17.5.1–17.5.4 (2011). doi:10.1109/IEDM.2011.6131574 Vandelli, L., Padovani, A., Larcher, L., Broglia, G., Ori, G., Montorsi, M., Bersuker, G., Pavan, P.: Comprehensive physical modeling of forming and switching operations in HfO\(_{\text{2 }}\) RRAM devices. In: Proceedings of IEEE International Electron Devices Meeting (IEDM), pp. 17.5.1–17.5.4 (2011). doi:10.​1109/​IEDM.​2011.​6131574
Metadaten
Titel
Stochastic circuit breaker network model for bipolar resistance switching memories
verfasst von
S. Brivio
S. Spiga
Publikationsdatum
29.08.2017
Verlag
Springer US
Erschienen in
Journal of Computational Electronics / Ausgabe 4/2017
Print ISSN: 1569-8025
Elektronische ISSN: 1572-8137
DOI
https://doi.org/10.1007/s10825-017-1055-y

Weitere Artikel der Ausgabe 4/2017

Journal of Computational Electronics 4/2017 Zur Ausgabe

S.I. : Computational Electronics of Emerging Memory Elements

Theoretical insights and experimental characterization of -based OxRRAMs operation

S.I. : Computational Electronics of Emerging Memory Elements

Filament-to-dielectric band alignments in and resistive RAMs

S.I.: Computational Electronics of Emerging Memory Elements

Cross-point memory design challenges and survey of selector device characteristics

Neuer Inhalt