Thickness can modify the strain state of the film through a gradient of deformation along the growth direction, it also defines whether a polydomain state is energetically favored compared to a monodomain one; the question of a minimum thickness for the onset of ferroelectricity is still debated and thickness plays a crucial role in the generation of dislocations. Therefore, several critical thicknesses can be met in the literature and the following paragraphs deal with them.
Thickness dependent relaxation
Qiu et al. have published recently a thickness versus misfit strain phase diagram for PbTiO
3 thin films from thermodynamical calculations [
146]. This study considers the possibility of stabilizing monodomain structures and generating misfit dislocations with realistic electrodes (considered through their screening length in the expression of the depolarizing field). They find that the monoclinic so-called r phase is stable on very narrow ranges of misfit strain and thickness and that the tetragonal c phase or the polydomain a/c/a/c phase are the most probable ones considering typical experimental conditions. Their phase diagrams also exhibit the possibility to stabilize a new phase, called
a′
c′, in which the polarization components are equal to the ones of the c and a phase, i.e., P
a′c′[100] = P
a[100] and P
a′c′[001] = P
c[001]. This phase diagram incorporates all the main parameters determining the stable phase. It is however based on the Matthews–Blakeslee criteria which underestimates the critical thickness for dislocation generation (see “
Critical thickness for dislocations generation” section) and therefore the absolute value of the mentioned thicknesses should be taken with care.
An exponential profile over the thickness for the stress has been considered in several models [
147] and compared to experimental variation with thickness of the lattice parameters for Pb(Zr
0.4Ti
0.6)O
3 [
147]. Catalan et al. [
148] have used this exponential decay of the strain and X-ray diffraction analysis to calculate the strain profile. They have then introduced this gradient into a phenomenological calculation and calculated the dielectric constant as a function of both temperature and thickness, to finally compare their calculations with their experiments. This shows that strain gradient, through the flexoelectric effect can alter the dielectric properties of thin films even when their thickness is of several hundreds of nanometers [
148].
A different behavior was reported recently by Bartasyte et al. on multidomain PbTiO
3 thin films (from 30 to 460 nm thick) on LaAlO
3 [
149]. Stress measurements were carried out by X-ray diffraction and Raman spectroscopy, leading to residual stresses between 0.4 and 2 GPa that are in the range of reported values for polycrystalline thin films (see [
149] and references therein) and comparable to the ones reported for monodomain thin films [
97,
98]. The evolution of the a domain fraction presents a maximum whereas the residual stress decreases linearly. This is contradictory with the temperature–misfit strain phase diagrams proposed in [
96]. Indeed, at constant temperature, the domain population is a monotonous function (but not continuous at the transition between the a/c/a/c and a phases according to the domain stability map, see “
Domain stability map” section) of the misfit strain. However, considering the room temperature thickness-misfit strain phase diagram developed by Qiu et al. [
146] and forgetting about the absolute values of the thickness reported on it, one sees that the domain population evolves in a non linear way in the c/a/c/a phase. From the out-of-plane lattice parameters reported by Bartasyte et al. [
149] and considering an elastic deformation of a tetragonal material characterized by a Poisson coefficient of 0.37 [
89], one finds that the (thermodynamic) misfit strain goes from approximatively 0 (for the thickest film) to +2% (for the thinnest one). Therefore, a non-linear evolution of the domain population with thickness is not in contradiction with this phase diagram. For clarity sake, let us note that the “misfit strain” evoked in [
149] is due to the lattice mismatch between the substrate and the bulk and their “residual stress” is linked to the actual lattice parameter of the film, and therefore to the (thermodynamic) misfit strain. These two are markedly different, as pointed out by Bartasyte et al. as they are of opposite signs.
A surprising result has been reported by Gariglio et al. [
101] on monodomain tetragonal Pb(Zr
0.2Ti
0.8)O
3 thin films deposited on (Nb doped) SrTiO
3 substrates. Even though elastic relaxation occurs when thickness is increased from 15 to 123 nm (through the exponential increase of the in-plane lattice parameter and the corresponding decrease of the out-of-plane one) the transition temperature remains constant. This report is in contradiction with other reports by Fong et al. on PbTiO
3 ultrathin films (from 3 to 30 unit cells) deposited on SrTiO
3 [
150] or SrRuO
3 [
151]. As pointed out by the authors, this seems in contradiction with the temperature–misfit strain phase diagram developed by Pertsev et al. [
94]. However, the value of the misfit strain for the thinnest film has been calculated by the authors to be of −23 × 10
−3 [
101], which is not in the range of the misfit strain considered in the phase diagram.
Let us recall that the Landau polynomial used by Pertsev
et al. [
94] is of sixth order and therefore limits the range of the misfit strains that can be considered. As the misfit strain for the thickest film is still of 9 × 10
−3 it lies out of the range of misfit reported on Pertsev’s et al. phase diagram [
94].
Critical thickness for the onset of ferroelectricity
Due to the cooperative nature of ferroelectricity, the question of the minimum thickness in which ferroelectricity can develop is of particular interest. Ferroelectricity has been measured in 5 nm [
152], 4 nm [
153] and even in a 1.2 nm [
150,
154,
155] crystalline films and in a 1 nm polymer [
156] film. Taking into account realistic interface between the ferroelectric thin film and the electrodes, i.e., a finite screening length of the electrodes as well as the details of the interface, ab-initio calculations showed that a critical thickness for ferroelectricity still exist [
157]. Despite the short circuit conditions imposed on the electrodes, a depolarizing field arises into the film due to the imperfect screening of the surface charges by the electrodes.
Recently, Glinchuk et al. [
158] showed, thanks to phenomenological calculations, that the reduction of thickness under nonideal short-circuit conditions leads not to a paraelectric state but to an electret state. This state is characterized by the vanishing of the polarization loop, the variation of the polarization with applied electric field being asymmetrical and shifted by the internal electric field that develops due to the imperfect screening of the surface charges. In the electret state pyroelectric effect remains and the film does not transit to a nonpolar state at higher temperature. A critical thickness under which the film is paraelectric only exists when no internal field exist (under the application of a canceling exterior electric field for example) [
158].
Very recently, Sai et al. [
159] studied by first-principles ultra-thin improper ferroelectric films, i.e., materials for which the primary order parameter, the one driving the phase transition, is not the polarization. They show for isolated single domain YMnO
3 ultrathin films (down to 2 unit cell thick) that there is no critical thickness under which the paraelectric state is stable, even under open circuit boundary conditions.
Critical thickness for mono- to polydomain transition
With increasing thickness, a transition from a monodomain state (i.e., possibly containing only 180° domains in the tetragonal case) to a polydomain state (with 90° domains in the same symmetry) has been considered theoretically [
85‐
88,
91]. In a monodomain film, the 180° domains reduce the depolarizing field, forming domain stripes as observed on PbTiO
3 thin films [
73]. In a polydomain film, the 90° domain structure is a consequence of the minimization of elastic energies as well as the electrostatic one. The concept of critical thickness for domain formation in ferroelectric thin film was developed by Pompe et al. [
88]. In the same article, the thickness dependence of the minimum domain wall thickness was also developed. Their model considered only the competition between elastic energy reduction and increase in energy due to domain wall creation. Electrical conditions, kinetics of domain wall motion, energy linked to defect generation, nucleation of domains were assumed to be negligible. Although these apparent limitations, their calculations of the critical thickness were confirmed on 30 nm PbTiO
3 thin films deposited on DyScO
3 [
160] where a critical thickness around 10 nm and a domain structure consisting of alternating wide c domains and narrow a domains (with width down to the minimum value of 6–7 nm) with a period of 27–31 nm. These values are the minimum ones preserving the horizontal coherency of the film. This configuration does not fall into the scope of the theory developed by Roytburd et al. [
85‐
87] and Pertsev et al. [
123] as the domain periodicity has to be smaller than the thickness of the film. Considering Kittel’s law [
161], which states that the domain period increases with the square root of the thickness of the film, one sees that Roytburd’s model implies to consider thicker film than the one studied by Vlooswijk et al. [
160].
The misorientation of the different variants of the tetragonal domains illustrated in Fig.
1 implies to take a closer look at the situation near the interface with the surface. Instead of parallel domain walls, steps have been observed by transmission electron microscopy [
71] in the domain wall profile leading to wedge-shaped a domains. This was later confirmed by calculations [
162]. In addition, the domains were observed to start from dislocations standing off the interface [
71]. This shape minimizes the strain at the interface due to the clamping on the substrate and enables the misorientation to be compensated. This shape is however a function of the stiffness of the substrate, a higher stiffness leading to a higher interface strain and therefore minimizing the width of the a domain a the interface with substrate [
71,
162]. As a consequence, the a domain walls observed on the SrRuO
3 electrode deposited on DyScO
3 were parallel [
71]. It has to be noted that domains were intentionally generated in these PbTiO
3 films deposited on SrTiO
3 by modifying the deposition conditions. For tetragonal PbZrTiO
3 films grown under optimal conditions (i.e., as close as possible to the thermodynamic equilibrium), the expected and observed domain structure consists of (180°) c domains, in this thickness range (for PbTiO
3: 100 nm in [
98], 110 nm in [
71]; for Pb (Zr
0.2Ti
0.8)O
3: 90 nm in [
163], 100 nm in [
97]).
Critical thickness for dislocations generation
The difference in thermal expansion coefficients does not give rise to a thermal strain that is sufficient to enable dislocation generation during cooling from the deposition temperature (on the contrary to what was considered [
111]). This is confirmed by the thermal evolution of the in-plane lattice parameters of monodomain films that run parallel to the substrate’s one [
97,
98,
101,
100]. Additional dislocations would indeed enable the in-plane lattice parameter of the film to relax toward its bulk value. The dislocations are therefore introduced during deposition or at the bulk para-ferroelectric transition.
Frank and van der Merwe [
164,
165] introduced 60 years ago the concept of the critical thickness above which misfit dislocation formation was the energetically favored stress-relieving mechanism at the interface of an heteroepitaxial system. More precisely, considering a monolayer, they introduced the notion of critical misfit value above which introducing dislocation was energetically favored. The Matthews-Blakeslee [
166] model has been the most used one to calculate this critical thickness. It is based on equilibrium considerations with its equations derived from the search of the total (i.e., elastic strain and dislocation) energy minimum or from equilibrating the forces acting on a dislocation.
From Matthews-Blakeslee’s criteria [
166], the linear density of dislocation (ρ) is expected to vary according to:
$$ \rho\left|\bf{b}\right|\cos{(\lambda)}=\epsilon_{\rm m}-\frac{l(h)}{(1+\nu)h} $$
(3)
with
\(\left|{\bf b}\right|\) the norm of Burgers vector, λ the angle between the Burgers vector, and a line belonging to both the interface and to a plane normal to the dislocation line,
\(\epsilon_m=\frac{a_{//}-a_0}{a_0}\) the misfit strain,
h the thickness, ν Poisson coefficient. The last term,
l(
h), is defined as:
\(l(h)=\frac{\left|{\bf b}\right|} {8\pi\cos{\lambda}}(1-\nu(\cos{\beta})^2)\ln\left(\frac{\alpha h} {\left|\bf{b}\right|}\right)\) with β the angle between the dislocation line and the Burgers vector, and α a parameter taking into account the nature of the chemical bonding (varying between three for ionic crystals and four for covalent ones). In the case of a monodomain film as well as in the a
1/a
2/a
1/a
2 structure, we would like to repeat that the Burgers vectors lie
in the plane of the interface and the domain walls are
vertical (see “
Limitations” section). Therefore
\({\bf b}//[100]\) or [010]
\((\left|{\bf b}\right|=\max(a_{\rm s},a_{//}))\), λ = 0, and β = π/2.
Following Speck and Pompe [
111], this dislocation density could be approximated by:
$$ \rho\approx\frac{\epsilon_{\rm m}} {\left|\bf{b}\right|(\cos{(\lambda)})^2}\left(1-\frac{t_{\rm cr}} {t}\right) $$
(4)
However this implies, as pointed out in their paper: l(h)≈ l(hc), i.e., \(\ln{h}\approx\ln{h_{\rm c}}.\)
This model proved to be adequate to describe the situation in metals. Several models have been developed from Matthews–Blakeslee’s, for metals and semiconductors. Let us cite the one by Fischer et al. [
167] who extended Matthews–Blakeslee’s model to take into account the interaction between straight dislocations and the one by Chidambarrao et al. [
168] who also extended it by taking into account the effect of Peierls barrier. However, for ferroelectrics, it usually predicts critical thicknesses that are smaller than what has been observed experimentally.
Another model, developed by People and Bean [
169] for semiconductors, considered a nucleation barrier that had to be overcome by the misfit strain in order to favor misfit dislocations generation. Venkatesan et al. [
71] used this latter model to describe their PbTiO
3 thin films deposited on SrTiO
3. The thickness range covered by their study extends from 22 to 340 nm and a slow growth rate prevented the formation of a domains. High-resolution transmission electron microscopy and X-ray diffraction revealed the absence of dislocations for all thickness up to 340 nm. The critical thickness derived from People and Bean’s model reads [
169,
170]:
$$ t_{\rm cr}=\frac{1-\nu}{1+\nu}\frac{1} {16\pi\sqrt{2}}\frac{\left|\bf{b}\right|^2}{a_0}\frac{1} {\epsilon^2}\ln\left(\frac{t_{\rm cr}}{\left|\bf{b}\right|}\right) $$
(5)
with ε the relative difference between the substrate and bulk lattice parameters. Venkatesan et al. considered the expression of People and Bean’s model reported by Maree et al. [
171] for the case plotted by People and Bean in [
169] (and corrected in [
170]) in which they considered
\(\left|{\bf b}\right|\approx2\sqrt{2}a_0\) and considered five <110> atom spacings, hence the slightly different expression reported by Maree et al. and used by Venkatesan et al. Interestingly, following People and Bean’s model, calculations have shown that the use of small seed pads on a substrate enable the critical thickness to tend toward infinity for pads with lateral dimensions below a critical size [
172]. Even if the orientation of the Burgers vector and the mean value of the effective interfacial width of isolated dislocations may be different from the one considered, the work by Venkatesan et al. points out meaningfully the discrepancies in critical thickness that can be calculated depending on the model considered.
Their work underlines therefore the need for a model designed specifically for ferroelectrics or, more generally for functional oxides, which is still lacking despite the numerous experimental evidence of the influence of dislocations on the properties of ferroelectric thin films.
Jesser and Fox [
173] showed that on substrates not as perfect as silicon ones may be, the propagation of preexisting dislocations (rather than a nucleation barrier) was the limiting parameter. Indeed, this friction stress is much higher in semiconductors than in metals. In addition, the density of dislocations generated on these not-so-perfect substrates is evidently much higher and therefore their interaction may come into play. They then developed [
173] a model including frictional stress applicable to both metals and semiconductors.
A comprehensive study of the defect microstructure in tetragonal Pb(Zr
0.2Ti
0.8)O
3 thin films on SrTiO
3 has been reported by Misirlioglu et al. [
174]. The investigated thin films were mainly c-oriented with a minority of a
1 and a
2 domains and displayed both threading dislocations as well as misfit dislocations. The density of the former ones is high (over 10
10 cm
−2) and their origin is attributed, in a Volmer–Weber growth mode, to the coalescence of the islands, forcing the misfit dislocations away from the interface with the substrate [
174]. The former explanation of threading dislocations being the continuation of the ones existing in the substrate [
166] could only account for a small fraction of them. Misirlioglu et al. pointed out [
174] that the domain structure, created to accommodate part of the spontaneous strain associated with the phase transition, nucleates at misfit dislocations. These domains are then pinned because of the microstresses generated by the misfit dislocations and therefore the extrinsic contribution (i.e., domain wall movements) to the piezoelectric coefficients that plays a major role in the
bulk is strongly reduced in thin films. This lead the authors to conclude that the electrical and electromechanical properties of polydomain thin films should be inferior to the bulk ones. Thermodynamic calculations further showed that the impact of threading dislocations (with a direction line perpendicular to the interface) was “limited” to the smearing of the transition temperature, and that the strongest impact on the other functional properties was indeed due to the misfit dislocations [
174].
This is somehow in contradiction with the measurements of 180° domain wall creeplike velocity in tetragonal PZT films [
175,
176], complemented by measurements of domain wall roughness [
177]. For 180° domain walls other models describe their motion, such as the dynamic poling model developed by Trolier–McKinstry et al. [
178]. However, the clamping of 90° domain walls was shown to be reduced through nanoisland patterning of the film using focused ion beam, resulting in a strong enhancement of the properties [
179]. It is worth mentioning that, in addition to dislocations, point defects, such as oxygen vacancies, have a critical influence on the domain wall thickness [
180].
The misfit dislocations, through the localized strain field generated around them, induce locally a strong reduction of polarization which is detrimental to the properties of the film (see [
174] and references therein for the consequences on polarization loops, dielectric, and piezoelectric properties). This was confirmed recently by the study of polarization and piezoelectric properties on Pb(Zr
0.52Ti
0.48)O
3 thin films [
110]. The strong reduction of polarization was also shown recently to reach 48% in a Pb(Zr
0.2Ti
0.8)O
3 film deposited on SrTiO
3 and covered by a SrTiO
3 film [
181]. Morelli et al. [
182] attributed this effect to the steps observed in the domain walls [
71] giving rise to leakage currents that dominate the polarization reversal measured by piezo-force miscroscopy. Interfacial dislocations were also held responsible for the poor piezoresponse observed for Pb(Zr
0.52Ti
0.48)O
3 nanoislands [
183]. A comparison between the properties of Pb(Zr
0.2Ti
0.8)O
3 films free from extended defects and films presenting 90° domains have been carried out by Vrejoiu et al. [
163]. If the polarization is indeed reduced in the case of defective films, the dielectric constant was found to be higher, indicating that the pinning of the domain walls by misfit dislocations is not as effective as to suppress completely extrinsic contributions to the dielectric properties of ferroelectric thin films as predicted in [
174]. A recent review of both the influence of growth conditions and of the microstructure of perovskite films has been published recently by Vrejoiu et al. [
184].
Pálová et al. [
185] have proposed a model drastically different from the ones mentioned so far. Instead of a strain gradient induced by defects present throughout the whole film, a segregated strain gradient is proposed. This model is shown to reproduce the observed thickness dependence of ferroelectric thin films in a comparable manner as the ones based on inhomogeneous strains. In Pálová et al.’s model, the defects are located at the interface with the substrate, over a given thickness. As a consequence, the internal bias field generated is constant throughout the film (for a given thickness), whereas the bias field created by inhomogeneous strains in the film varies within the film. Hence, an applied electric field should be able to cancel the bias field of the segregated model and the film should exhibit bulk-like properties. This is the benchtop probe proposed by Pálová et al. [
185] that remains to be tested to the best of our knowledge.