Structural and optical properties of few-layer MoS₂ thin films grown on various substrates using RF sputtering process

Molybdenum disulphide (MoS₂) is a well-recognized two dimensional (2D) transition metal dichalcogenide (TMD) material that exhibits extraordinary structural and optical properties. This paper aims at extensive optimization of a few-layer MoS₂ film by exploiting different growth times. The RF sputter deposited few-layer MoS₂ films were deposited on three different substrates i.e. n-Si, p-Si and ITO coated glass, and the change in their structural and optical characteristics dominated by distinction in growth time from 5 to 20 min, have been analysed. The morphological, structural and optical properties of deposited few-layer MoS₂ were examined by Field effect scanning electron microscopy (FESEM), XRD, UV–Vis spectroscopy, atomic force microscopy (AFM), energy dispersive Xray (EDX), photoluminescence and Raman Spectroscopy. The main highlight of the present work is the possibility of getting photoluminescence property in the few-layer MoS₂ film by optimization of the film sputtering time. Further, it has also been observed that the sputtering time plays an important role in controlling the number of MoS₂ layers, and the overall structural and optical property of the film.