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Erschienen in:
Introduction to Metrology and Testing Kapitel lesen Erstes Kapitel lesen

2011 | OriginalPaper | Buchkapitel

6. Surface and Interface Characterization

verfasst von : Martin Seah, Dr., Leonardo De Chiffre

Erschienen in: Springer Handbook of Metrology and Testing

Verlag: Springer Berlin Heidelberg

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Abstract

While the bulk material properties treated in Part C of this handbook are obviously important, the surface characteristics of materials are also of great significance. They are responsible for the appearances of materials and surface phenomena, and they have a crucial influence on the interactions of materials with gases or fluids (in corrosion, for example; Chap. 12), contacting solids (as in friction and wear; Chap. 13) or biospecies (Chap. 14), and materials–environment interactions (Chap. 15). Surface and interface characterization have been important topics for very many years. Indeed, it was known in antiquity that impurities could be detrimental to the quality of metals, and that keying and contamination were important to adhesion in architecture and also in the fine arts. In contemporary technologies, surface modification or functional coatings are frequently used to tailor the processing of advanced materials. Some components, such as quantum-well devices and x-ray mirrors, are composed of multilayers with individual layer thicknesses in the low nanometer range. Quality assurance of industrial processes, as well as the development of advanced surface-modified or coated components, requires chemical information on material surfaces and (buried) interfaces with high sensitivity and high lateral and depth resolution. In this chapter we present the methods applicable to the chemical and physical characterization of surfaces and interfaces.
This chapter covers the three main techniques of surface chemical analysis: Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), and secondary ion mass spectrometry (SIMS), which are all still rapidly developing in terms of instrumentation, standards, and applications. AES is excellent for elemental analysis at spatial resolutions down to 10 nm, and XPS can define chemical states down to 10 μm. Both analyze the outermost atom layers and, with sputter depth profiling, layers up to 1 μm thick.
Dynamic SIMS incorporates depth profiling and can detect atomic compositions significantly below 1 ppm. Static SIMS retains this high sensitivity for the surface atomic or molecular layer but provides chemistry-related details not available with AES or XPS. New reference data, measurement standards, and documentary standards from ISO will continue to be developed for surface chemical analysis over the coming years.
The chapter also discusses surface physical analysis (topography characterization), which encompasses measurement, visualization, and quantification. This is critical to both component form and surface finish at macro-, micro-, and nanoscales. The principal methods of surface topography measurement are stylus profilometry, optical scanning techniques, and scanning probe microscopy (SPM). These methods, based on acquiring topography data from point-by-point scans, give quantitative information on surface height with respect to position. The integral methods, which are based on a different approach, produce parameters that represent some average property of the surface under examination. Measurement methods, as well as their application and limitations, are briefly reviewed, including standardization and traceability issues.

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Vorheriges Kapitel Nanoscopic Architecture and Microstructure
Nächstes Kapitel Mechanical Properties
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Metadaten
Titel
Surface and Interface Characterization
verfasst von
Martin Seah, Dr.
Leonardo De Chiffre
Copyright-Jahr
2011
Buch
Springer Handbook of Metrology and Testing

Print ISBN: 978-3-642-16640-2

Electronic ISBN: 978-3-642-16641-9

Copyright-Jahr: 2011

DOI
https://doi.org/10.1007/978-3-642-16641-9_6

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