Anzeige
Erschienen in:
2005 | OriginalPaper | Buchkapitel
Topside Plasma Scale Height Modelling Based on CHAMP Measurements: First Results
verfasst von : Stanimir M. Stankov, Norbert Jakowski
Erschienen in: Earth Observation with CHAMP
Verlag: Springer Berlin Heidelberg
Aktivieren Sie unsere intelligente Suche, um passende Fachinhalte oder Patente zu finden.
Wählen Sie Textabschnitte aus um mit Künstlicher Intelligenz passenden Patente zu finden. powered by
Markieren Sie Textabschnitte, um KI-gestützt weitere passende Inhalte zu finden. powered by
Presented are first results in retrieving, analysing, and modelling the topside plasma scale height by using CHAMP ionospheric radio occultation observations. The plasma scale height value in the region situated immediately above the ionospheric F2-layer density peak, is very important for the TEC calculation and plasma density reconstruction procedures based on GPS radio occultation measurements. Based on the year-long time series data accumulated so far, obtained were latitudinal, diumal, and seasonal variations of the topside plasma scale height. Considering the growing CHAMP measurement data base, it is possible to develop a new empirical model to be used for improving the process of electron density profile retrieval by delivering an improved initial guess of the topside electron density profile.