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Lasers in Manufacturing and Materials Processing
Erschienen in: Lasers in Manufacturing and Materials Processing 3/2017

14.07.2017

Ultraviolet-Diode Pump Solid State Laser Removal of Titanium Aluminium Nitride Coating from Tungsten Carbide Substrate

verfasst von: Tian Long See, Dimitrios Chantzis, Raphael Royer, Ioannis Metsios, Mohammad Antar, Sundar Marimuthu

Erschienen in: Lasers in Manufacturing and Materials Processing | Ausgabe 3/2017

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Abstract

This paper presents an investigation on the titanium aluminium nitride (TiAlN) coating removal from tungsten carbide (WC-Co) substrate using a diode pump solid state (DPSS) ultraviolet (UV) laser with maximum average power of 90 W, wavelength of 355 nm and pulse width of 50 ns. The TiAlN coating of 1.5 μm thickness is removed from the WC-Co substrate with laser fluence of 2.71 J/cm2 at 285.6 number of pulses (NOP) and with NOP of 117.6 at 3.38 J/cm2 fluence. Titanium oxide formation was observed on the ablated surface due to the re-deposition of ablated titanium residue and also attributed to the high temperature observed during the laser ablation process. Crack width of around 0.2 μm was observed over both TiAlN coating and WC-Co substrate. The crack depth ranging from 1 to 10 μm was observed and is related to the thickness of the melted carbide. The crack formation is a result of the thermal induced stresses caused by the laser beam interaction with the material as well as the higher thermal conductivity of cobalt compared to WC. Two cleaning regions are observed and is a consequence of the Gaussian distribution of the laser beam energy. The surface roughness of the ablated WC-Co increased with increasing laser fluence and NOP.
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Metadaten
Titel
Ultraviolet-Diode Pump Solid State Laser Removal of Titanium Aluminium Nitride Coating from Tungsten Carbide Substrate
verfasst von
Tian Long See
Dimitrios Chantzis
Raphael Royer
Ioannis Metsios
Mohammad Antar
Sundar Marimuthu
Publikationsdatum
14.07.2017
Verlag
Springer US
Erschienen in
Lasers in Manufacturing and Materials Processing / Ausgabe 3/2017
Print ISSN: 2196-7229
Elektronische ISSN: 2196-7237
DOI
https://doi.org/10.1007/s40516-017-0039-x

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