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Journal of Materials Science
Erschienen in: Journal of Materials Science 9/2017

04.01.2017 | Original Paper

UV-assisted reduction of graphite oxide to graphene by using a photoinitiator

verfasst von: Bing Xue, Yingquan Zou, Yuchun Yang

Erschienen in: Journal of Materials Science | Ausgabe 9/2017

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Abstract

Being a highly promising material, graphene has triggered a great attention within researchers as-well-as has obtained some achievements in specific application areas. However, applying graphene to electronic devices via a facile method has proven to be difficult. Here, we have fabricated graphene by reducing graphene oxide (GO) under a 395 nm ultraviolet (UV) irradiation in a suspension containing Bis(cyclopentadienyl)bis[2,6-difluoro-3-(1-pyrryl)phenyl]titanium (GR-FMT) and GO. GR-FMT is an efficient free-radical type of photoinitiator, which is commonly used in photoresists. GO quickly reduces to graphene by accepting electrons generated by the decomposition of the GR-FMT photoinitiator under UV irradiation. Here, the GR-FMT plays both reductant and deoxidant roles and highly improves the reducing reaction efficiency. Photo etching is a commonly used technique in electronic device technology; however, its application to the mass production of GO, to be used in practical nano-devices and integrated circuits, is still an unresolved problem. To address this problem, in this work, graphene oxide is suspended in ethanol and it undergoes reduction by the UV-irradiated GR-FMT suspension; the corresponding mechanism is explored. This methodology turns out to be a novel and facile UV-assisted reduction technique with the advantage of being time-efficient and energy-efficient, simple, scalable, and environmental friendly.
Vorheriger Artikel Facile synthesis of iron-doped hollow urchin-like MnO2 for supercapacitors
Nächster Artikel Relationship between nano-architectured Ti1−x Cu x thin film and electrical resistivity for resistance temperature detectors

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Metadaten
Titel
UV-assisted reduction of graphite oxide to graphene by using a photoinitiator
verfasst von
Bing Xue
Yingquan Zou
Yuchun Yang
Publikationsdatum
04.01.2017
Verlag
Springer US
Erschienen in
Journal of Materials Science / Ausgabe 9/2017
Print ISSN: 0022-2461
Elektronische ISSN: 1573-4803
DOI
https://doi.org/10.1007/s10853-016-0721-y

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