2014 | OriginalPaper | Buchkapitel
Varying Photoconductivity of ZnO as a Function of Annealing Temperature
verfasst von : Pranab Biswas, P. Banerji
Erschienen in: Physics of Semiconductor Devices
Verlag: Springer International Publishing
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Arsenic has been doped in MOCVD grown ZnO thin films using thermal diffusion technique from semi-insulating GaAs substrate. Hall measurements showed p-type conductivity in ZnO. XPS analyses reveal that As
Zn
–V
Zn
is the shallow acceptor complex which contributes p-type conductivity of the films. As the post-growth annealing temperature increased from 600 to 700
°
C the hole concentration also increased from 1.1 × 10
18
to 2.8 × 10
19
cm
−3
respectively. It shows an increase in UV-to-dark current ratio from 284 to 488 at 10 V respectively.